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Nanoimprinting

Known as: Nanoimprint 
A lithographic technique that is used to transfer the topographic patterns of a master (often called the mold or template) to a resistant material or… 
National Institutes of Health

Papers overview

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Highly Cited
2010
Highly Cited
2010
Triggering release of encapsulated cargo.
Highly Cited
2009
Highly Cited
2009
Morphology and wettability control of silicon cone arrays using colloidal lithography.
In this paper we present a simple method to fabricate ordered silicon cone arrays with controllable morphologies on a silicon… 
Highly Cited
2009
Highly Cited
2009
Matrix-assisted dip-pen nanolithography and polymer pen lithography.
The controlled patterning of nanomaterials presents a major challenge to the field of nanolithography because of differences in… 
Highly Cited
2007
Highly Cited
2007
Effects of modulus and surface chemistry of thiol-ene photopolymers in nanoimprinting.
Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol… 
Highly Cited
2005
Highly Cited
2005
6 nm half-pitch lines and 0.04 µm2 static random access memory patterns by nanoimprint lithography
A key issue in nanoimprint lithography (NIL) is determining the ultimate pitch resolution achievable for various pattern shapes… 
Highly Cited
2003
Highly Cited
2003
Large area direct nanoimprinting of SiO2–TiO2 gel gratings for optical applications
We demonstrated an economical way of fabricating gel–film-based devices by combining nanoimprint lithography (NIL) and a sol–gel… 
Highly Cited
2000
Highly Cited
2000
Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography
We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm… 
Highly Cited
1999
Highly Cited
1999
Positioning of self-assembled, single-crystal, germanium islands by silicon nanoimprinting
Strain energy from the lattice mismatch of a heteroepitaxial system can create “self-assembled,” single-crystal islands… 
Highly Cited
1998
Highly Cited
1998
Multilayer resist methods for nanoimprint lithography on nonflat surfaces
Five multilayer resist methods (three positive tones and two negative tones) have been devised for nanoimprint lithography on… 
Highly Cited
1995
Highly Cited
1995
Directional deposition of Cu into semiconductor trench structures using ionized magnetron sputtering
The primary metallization technique in the semiconductor industry for the past decade has been magnetron sputtering. The general… 
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