NSR 0430

Known as: NSR-0430 
 
National Institutes of Health

Papers overview

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2017
2017
Modular switched reluctance motors (MSRMs) normally have better characteristics than conventional SRMs (CSRMs) such as lower cost… (More)
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2015
2015
In order to achieve stable operation in cutting-edge semiconductor manufacturing, Nikon has developed NSR-S630D with extremely… (More)
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2009
2009
This work describes the identification and characterization of SurR, Pyrococcus furiosus sulphur (S(0)) response regulator. SurR… (More)
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2009
2009
For 32 nm half-pitch node, double patterning is recognized as the most promising technology since some significant obstacles… (More)
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2009
2009
Double patterning (DP), an extension of immersion, is the leading contender for the manufacturing of 32 nm half pitch node… (More)
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2008
2008
Nikon's production immersion scanners, including the NSR-S609B and the NSR-S610C, have now been in the field for over 2 years… (More)
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2007
2007
ArF immersion lithography has become accepted as the critical layer patterning solution for lithography going forward. Volume… (More)
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2007
2007
Enhanced resolution capability, defined in Rayleigh's criterion as: R = (k1*lambda)/NA (1); where R = minimum resolution, lambda… (More)
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2007
2007
Nikon released the world's first hyper-NA immersion scanner, the NSR-S609B with NA 1.07 at the beginning of 2006. With the… (More)
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2006
2006
VLSI chips are becoming denser and the industry is now moving to the development of devices at the 65nm node. While Nikon is… (More)
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