NSR 0430

Known as: NSR-0430

National Institutes of Health

Papers overview

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2019

Introduction Panic from needle and the cost can discourage some diabetic patients from monitoring their blood glucose levels in a…

2015

In order to achieve stable operation in cutting-edge semiconductor manufacturing, Nikon has developed NSR-S630D with extremely…

2014

Nikon’s new immersion scanner “NSR-S630D” has been developed to deliver enhanced product overlay and CD uniformity while…

2013

NSR-S622D, Nikon’s new ArF immersion scanner, provides the best and practicable solutions to meet the escalating requirement from…

2012

Pattern shrinks using multiple patterning techniques will continue to the 22nm half pitch (HP) node and beyond. The cutting-edge…

2009

For 32 nm half-pitch node, double patterning is recognized as the most promising technology since some significant obstacles…

2009

Double patterning (DP), an extension of immersion, is the leading contender for the manufacturing of 32 nm half pitch node…

2007

ArF immersion lithography has become accepted as the critical layer patterning solution for lithography going forward. Volume…

2007

Enhanced resolution capability, defined in Rayleigh's criterion as: R = (k1*lambda)/NA (1); where R = minimum resolution, lambda…

2006

VLSI chips are becoming denser and the industry is now moving to the development of devices at the 65nm node. While Nikon is…