Skip to search formSkip to main contentSkip to account menu

Low insertion force

Known as: LIF 
Low insertion force (LIF) is a technology used in integrated circuit sockets that are designed so the force required to insert or remove a package is… 
Wikipedia (opens in a new tab)

Related topics

Related topics

8 relations
Integrated circuitList of computing and IT abbreviationsSerial ATASocket 1

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2007
2007
1 Local image Features for Shoeprint Image Retrieval
This paper deals with the retrieval of scene-of-cri me (or scene) shoeprint images from a reference database of shoeprint images… 
2006
2006
Neutral argon density profile determination by comparison of spectroscopic measurements and a collisional-radiative model (invited)
Neutral atoms play important roles in non-fully-ionized plasmas. In helicon sources, neutral pumping and neutral damping of waves… 
2005
2005
Defragmenting the Module Layout of a Partially Reconfigurable Device
Modern generations of field-programmable gate arrays (FPGAs) allow for partial reconfiguration. In an online context, where the… 
2003
2003
Structure of 4-fluorophenol and barrier to internal -OH rotation in the S1-state
The structure and barrier to internal rotation of 4-fluorophenol in the ground state and the electronically excited S1-state has… 
2001
2001
low insertion force type connector
To the present invention, in the insertion force it is lower in the form of connector, to check that the available low inserted… 
1997
1997
A new pure ion plasma device with laser induced fluorescence diagnostic
We describe a new apparatus for magnetic confinement of a pure ion plasma, with laser diagnostics to measure test particle… 
1997
1997
Rovibronic analysis of the laser induced fluorescence excitation spectrum of the jet-cooled methoxy radical
The laser induced fluoresence excitation spectrum for the A 2A1↔X 2E transition of the methoxy radical has been reinvestigated… 
1997
1997
Analysis of the etching of silicon in an inductively coupled chlorine plasma using laser thermal desorption
The etching of silicon by a chlorine inductively coupled plasma (ICP) was studied using laser desorption laser-induced… 
1996
1996
Laser-Induced Fluorescence and Mass Spectrometric Studies of the Cu + HCl Reaction over a Wide Temperature Range. Formation of HCuCl
The kinetics and products of the Cu + HCl reaction have been studied using high-temperature fast-flow reactors (HTFFR). The rate… 
1996
1996
MECHANO- AND THERMOLUMINESCENCE OF CA DOPED LIF CRYSTALS