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LEGO Digital Designer

Known as: LDD 
LEGO Digital Designer, or LDD, is a free computer program produced by the LEGO Group as a part of LEGO Design byME. It is available for Mac and… 
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Related topics

Related topics

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Computer-aided designLDrawMicrosoft Windows

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2003
2003
Oxide reliability of drain engineered I/O NMOS from hot carrier injection
The impact of hot carrier stress on the breakdown properties of I/O NMOS gate oxide is reported. I/O NMOS devices with drain… 
1997
1997
Investigation of interface traps in LDD pMOST's by the DCIV method
Interface traps in submicron buried-channel LDD pMOSTs, generated under different stress conditions, are investigated by the… 
1997
1997
Fmax enhancement of dynamic threshold-voltage MOSFET (DTMOS) under ultra-low supply voltage
The high frequency characteristics of DTMOS are described here for the first time. Our DTMOS has a small parasitic resistance due… 
Highly Cited
1995
Highly Cited
1995
Near-far resistant detection of CDMA signals via isolation bit insertion
This paper presents a novel scheme for near-far resistant CDMA detection: isolation bit insertion (IBI). At the transmitter… 
1992
1992
GMSK with Frequency-Selective Rayleigh Fading and Cochannel Interference
  • I. Korn
  • IEEE J. Sel. Areas Commun.
  • 1992
  • Corpus ID: 41110521
The author derives a formula for error probability of partial-response continuous-phase modulation with differential phase… 
Highly Cited
1987
Highly Cited
1987
A model for the electric field in lightly doped drain structures
A semi-quantitative model for the lateral channel electric field in LDD MOSFET's has been developed. This model is derived from a… 
1986
1986
A novel submicron LDD transistor with inverse-T gate structure
A novel submicron LDD transistor is demonstrated in which there is a thin extension of the gate polysilicon under the oxide… 
Highly Cited
1984
Highly Cited
1984
Structure-enhanced MOSFET degradation due to hot-electron injection
Device degradation due to channel hot-electron injection in several nonconventional MOSFET structures including minimum-overlap… 
Highly Cited
1984
Highly Cited
1984
A capacitance method to determine channel lengths for conventional and LDD MOSFET's
A simple method for determining the channel length and in situ gate-oxide thickness of MOSFETs is described. The method is based… 
Highly Cited
1982
Highly Cited
1982
Fabrication of high-performance LDDFET's with Oxide sidewall-spacer technology
A fabrication process for the Lightly Doped Drain/Source Field-Effect Transistor, LDDFET, that utilizes RIE produced SiO2sidewall… 
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