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Input mask
In computer programming, an input mask refers to a string expression, defined by a developer, that governs what a user is allowed to enter in as…
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Semantic Scholar uses AI to extract papers important to this topic.
2019
2019
Fully Automated Differential Fault Analysis on Software Implementations of Block Ciphers
Xiaolu Hou
,
J. Breier
,
Fuyuan Zhang
,
Yang Liu
IACR Trans. Cryptogr. Hardw. Embed. Syst.
2019
Corpus ID: 123751158
Differential Fault Analysis (DFA) is considered as the most popular fault analysis method. While there are techniques that…
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2015
2015
A spatial database for landslides in northern Bavaria: A methodological approach
Daniel Jäger
,
Thomas M. Kreuzer
,
M. Wilde
,
Stefan Bemm
,
B. Terhorst
2015
Corpus ID: 54614261
2012
2012
SVD Based Automatic Detection of Target Regions for Image Inpainting
Milind G. Padalkar
,
M. Zaveri
,
M. Joshi
ACCV Workshops
2012
Corpus ID: 8013990
We are often required to retouch images in order to improve their visual appearance, by removing the visual discontinuities like…
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2012
2012
MobilePaperAccess: Ubiquitous Paper-based Interfaces for Mobile Interactions
Yun Zhou
,
B. David
,
R. Chalon
ANT/MobiWIS
2012
Corpus ID: 13380339
2010
2010
Aberration-aware robust mask design with level-set-based inverse lithography
Yijiang Shen
,
N. Wong
,
E. Lam
Photomask Japan
2010
Corpus ID: 109787045
Optical proximity correction (OPC) is one of the most widely used Resolution Enhancement Techniques (RET) in mask designs…
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2009
2009
A New Technique for Multidimensional Linear Cryptanalysis with Applications on Reduced Round Serpent
J. Cho
,
Miia Hermelin
,
K. Nyberg
International Conference on Information Security…
2009
Corpus ID: 18202407
In this paper, we present a new technique for Matsui's algorithm 2 using multidimensional linear approximation. We show that the…
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2007
2007
A pixel-based regularization approach to inverse lithography
A. Poonawala
,
P. Milanfar
2007
Corpus ID: 15621577
2004
2004
Progressive architecture of mask supply chain and integrated operation system supporting extreme-QTAT device manufacturing
M. Mori
,
I. Miyazaki
,
Ken Fujimoto
,
K. Hosono
Photomask Japan
2004
Corpus ID: 110670031
In recent years, Quick-TAT (Turn-Around Time) in preparing masks is very important factor together with the complexity and cost…
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2003
2003
Masking Errors Through Software Robustness
Z. Al-Khanjari
,
M. Woodward
,
N. S. Kutti
,
H. Ramadhan
,
K. Shihab
International Conference on Internet Computing
2003
Corpus ID: 9134246
1995
1995
Emergent F Aces in Crystal Etching
T. Hubbard
,
E. Antonsson
1995
Corpus ID: 15098222
The time development of emergent faces in crystal etching is investigated. We present and discuss a novel computational approach…
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