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Input mask
In computer programming, an input mask refers to a string expression, defined by a developer, that governs what a user is allowed to enter in as…
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Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
Review
2020
Review
2020
Scaling Symbolic Methods using Gradients for Neural Model Explanation
Subham S. Sahoo
,
Subhashini Venugopalan
,
Li Li
,
Rishabh Singh
,
Patrick F. Riley
International Conference on Learning…
2020
Corpus ID: 220266076
Symbolic techniques based on Satisfiability Modulo Theory (SMT) solvers have been proposed for analyzing and verifying neural…
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2019
2019
Inductive Guided Filter: Real-time Deep Image Matting with Weakly Annotated Masks on Mobile Devices
Yaoyi Li
,
Jianfu Zhang
,
Weijie Zhao
,
Hongtao Lu
arXiv.org
2019
Corpus ID: 155100208
Recently, significant progress has been achieved in deep image matting. Most of the classical image matting methods are time…
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2014
2014
"UML Quiz": Automatic Conversion of Web-Based E-Learning Content in Mobile Applications
Alexander von Franqué
,
H. Tellioglu
2014
Corpus ID: 11469997
Many educational institutions use Learning Management Systems to provide e-learning content to their students. This often…
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2013
2013
Fault Rate Analysis: Breaking Masked AES Hardware Implementations Efficiently
An Wang
,
Man Chen
,
Zongyue Wang
,
Xiaoyun Wang
IEEE Transactions on Circuits and Systems - II…
2013
Corpus ID: 27156162
In 2011, Li presented clockwise collision analysis on nonprotected Advanced Encryption Standard (AES) hardware implementation. In…
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2012
2012
SVD Based Automatic Detection of Target Regions for Image Inpainting
Milind G. Padalkar
,
M. Zaveri
,
M. Joshi
ACCV Workshops
2012
Corpus ID: 8013990
We are often required to retouch images in order to improve their visual appearance, by removing the visual discontinuities like…
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2012
2012
MobilePaperAccess: Ubiquitous Paper-based Interfaces for Mobile Interactions
Yun Zhou
,
B. David
,
R. Chalon
ANT/MobiWIS
2012
Corpus ID: 13380339
2010
2010
Aberration-aware robust mask design with level-set-based inverse lithography
Yijiang Shen
,
N. Wong
,
E. Lam
Photomask Japan
2010
Corpus ID: 109787045
Optical proximity correction (OPC) is one of the most widely used Resolution Enhancement Techniques (RET) in mask designs…
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Review
2005
Review
2005
Steganography and Encryption Systems Based on Spatial Correlators with Meaningful Output Images
Joseph Rosen
,
B. Javidi
2005
Corpus ID: 1460136
Three different optical security systems are surveyed in this chapter. Their common feature is the appearance of meaningful…
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2004
2004
Progressive architecture of mask supply chain and integrated operation system supporting extreme-QTAT device manufacturing
M. Mori
,
I. Miyazaki
,
Ken Fujimoto
,
K. Hosono
Photomask Japan
2004
Corpus ID: 110670031
In recent years, Quick-TAT (Turn-Around Time) in preparing masks is very important factor together with the complexity and cost…
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2003
2003
Masking Errors Through Software Robustness
Z. Al-Khanjari
,
M. Woodward
,
N. S. Kutti
,
H. Ramadhan
,
K. Shihab
International Conference on Internet Computing
2003
Corpus ID: 9134246
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