Skip to search form
Skip to main content
Skip to account menu
Semantic Scholar
Semantic Scholar's Logo
Search 226,341,956 papers from all fields of science
Search
Sign In
Create Free Account
Hybrid fibre-optic
Known as:
HFO
Hybrid fibre-optic is the connection used by some television studio and field production video cameras that combine all video, audio, data, control…
Expand
Wikipedia
(opens in a new tab)
Create Alert
Alert
Related topics
Related topics
1 relation
Optical fiber
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
Highly Cited
2009
Highly Cited
2009
Ultra low-EOT (5 Å) gate-first and gate-last high performance CMOS achieved by gate-electrode optimization
L. Ragnarsson
,
Zilan Li
,
+10 authors
T. Hoffmann
International Electron Devices Meeting
2009
Corpus ID: 30793094
A novel gate first integration approach enabling ultra low-EOT is demonstrated. HfO<sub>2</sub> based devices with a zero…
Expand
Highly Cited
2006
Highly Cited
2006
High-performance poly-silicon TFTs using HfO/sub 2/ gate dielectric
Chia-Pin Lin
,
B. Tsui
,
Ming-Jui Yang
,
Ruei-Hao Huang
,
C. Chien
2006
Corpus ID: 97707676
High-performance low-temperature poly-Si thin-film transistors (TFTs) using high-/spl kappa/ (HfO/sub 2/) gate dielectric is…
Expand
Highly Cited
2004
Highly Cited
2004
Effect of surface NH3 anneal on the physical and electrical properties of HfO2 films on Ge substrate
N. Wu
,
Qingchun Zhang
,
+10 authors
N. Balasubramanian
2004
Corpus ID: 55028092
Metal-oxide-semiconductor capacitors were fabricated on germanium substrates by using metalorganic-chemical-vapor-deposited HfO2…
Expand
Highly Cited
2004
Highly Cited
2004
Fermi pinning-induced thermal instability of metal-gate work functions
H. Yu
,
C. Ren
,
+6 authors
D. Kwong
IEEE Electron Device Letters
2004
Corpus ID: 40226918
The dependence of the metal-gate work function on the annealing temperature is experimentally studied. We observe increased Fermi…
Expand
Highly Cited
2004
Highly Cited
2004
A TaN-HfO/sub 2/-Ge pMOSFET with NovelSiH/sub 4/ surface passivation
Nan Wu
,
Qingchun Zhang
,
+7 authors
D. Kwong
IEEE Electron Device Letters
2004
Corpus ID: 27314651
In this letter, we demonstrate a novel surface passivation process for HfO/sub 2/ Ge pMOSFETs using SiH/sub 4/ surface annealing…
Expand
Highly Cited
2003
Highly Cited
2003
Theoretical and experimental investigation of Si nanocrystal memory device with HfO/sub 2/ high-k tunneling dielectric
J.J. Lee
,
X. Wang
,
W. Bai
,
N. Lu
,
J. Liu
,
D. Kwong
Symposium on VLSI Technology. Digest of Technical…
2003
Corpus ID: 29782704
This paper describes improved memory characteristics of the Si nanocrystal memory devices by replacing the traditional SiO/sub 2…
Expand
2003
2003
Effect of bulk trap density on HfO/sub 2/ reliability and yield
R. Degraeve
,
A. Kerber
,
+4 authors
G. Groeseneken
IEEE International Electron Devices Meeting
2003
Corpus ID: 29508072
The trap density in an ALD SiO/sub 2//HfO/sub 2/ stack is measured with charge pumping. A critical trap density at breakdown is…
Expand
2002
2002
Additional scattering effects for mobility degradation in Hf-silicate gate MISFETs
T. Yamaguchi
,
R. Iijima
,
T. Ino
,
A. Nishiyama
,
H. Satake
,
N. Fukushima
Digest. International Electron Devices Meeting,
2002
Corpus ID: 10495889
By controlling the crystallization in Hf-silicate gate dielectrics, we directly observed that the crystallized-HfO/sub 2…
Expand
Highly Cited
2002
Highly Cited
2002
Structural and electrical properties of HfO2 with top nitrogen incorporated layer
Hag-Ju Cho
,
Chang Seok Kang
,
+5 authors
J.C. Lee
IEEE Electron Device Letters
2002
Corpus ID: 65155
A novel technique to control the nitrogen profile in HfO/sub 2/ gate dielectric was developed using a reactive sputtering method…
Expand
Highly Cited
2001
Highly Cited
2001
Performance and reliability of ultra thin CVD HfO/sub 2/ gate dielectrics with dual poly-Si gate electrodes
S.J. Lee
,
H. Luan
,
+5 authors
D. Kwong
Symposium on VLSI Technology. Digest of Technical…
2001
Corpus ID: 25819610
MOSFETs with high quality ultra thin (EOT/spl sim/10.3 /spl Aring/) HfO/sub 2/ gate stacks and self-aligned dual poly-Si gate are…
Expand
By clicking accept or continuing to use the site, you agree to the terms outlined in our
Privacy Policy
(opens in a new tab)
,
Terms of Service
(opens in a new tab)
, and
Dataset License
(opens in a new tab)
ACCEPT & CONTINUE
or Only Accept Required