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Electrical connection

Known as: Connection 
An electrical connection between discrete points allows the flow of electrons (electric current). A pair of connections is needed for a circuit… 
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Related topics

Related topics

15 relations
Acoustic couplerCircuit diagramElectrical connectorHot Interconnects

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
Highly Cited
2009
Highly Cited
2009
Nanowire Photonics Nanowire Growth
Photonics involves the control of photons in free space or in matter. Manipulation of photons in semiconductor bulk crystals and… 
Highly Cited
2005
Highly Cited
2005
Monolayer metallic nanotube interconnects: promising candidates for short local interconnects
Mono- or bi-layer metallic single-wall carbon nanotube interconnects have lateral capacitances more than four times smaller than… 
Review
2002
Review
2002
Sensors from electrodeposited metal nanowires
Based on their electronic conductivity behaviour, metallic nanowires may have analytical applications ranging from interconnects… 
Highly Cited
1997
Highly Cited
1997
A high performance 1.8 V, 0.20 /spl mu/m CMOS technology with copper metallization
A high performance 0.20 /spl mu/m logic technology has been developed with six levels of planarized copper interconnects. 0.15… 
Review
1994
Review
1994
Free-space digital optical systems
Within the past 15 years there has been significant progress in the development of two-dimensional arrays of optical and… 
Highly Cited
1993
Highly Cited
1993
Electromigration characteristics of copper interconnects
The electromigration characteristics of electroless plated copper interconnects have been investigated under DC and time-varying… 
Highly Cited
1987
Highly Cited
1987
Superconductors as very high-speed system-level interconnects
The anticipated propagation characteristics at 77 K of superconducting transmission lines using the new high critical temperature… 
Highly Cited
1985
Highly Cited
1985
Stress Induced Voids in Aluminum Interconnects During IC Processing
Voids in the aluminum metallization of integrated circuits can be created under certain device fabrication conditions. The… 
Highly Cited
1982
Highly Cited
1982
Titanium disilicide self-aligned source/drain + gate technology
Silicides have been used to lower the resistance of gate level interconnects. Recently silicidation of source/drain diffusions… 
Review
1980
Review
1980
Refractory Silicides of Titanium and Tantalum for Low-Resistivity Gates and Interconnects
A study of the refractory-gate metallization schemes had been undertaken to provide a low-resistivity metallization for LSI and… 
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