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Debian

Known as: Debian LTS, Woody (Debian), DPL 
Debian (/ˈdɛbiən/) is a Unix-like computer operating system that is composed entirely of free software, most of which is under the GNU General Public… 
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389 Directory ServerArch LinuxBuffalo network-attached storage seriesClang

Papers overview

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Highly Cited
2003
Highly Cited
2003
WOODY PLANT ESTABLISHMENT AND SPATIAL HETEROGENEITY IN GRASSLANDS
Root exclusion experiments demonstrated the importance of belowground competition between grasses and Prosopis glandulosa (honey… 
Highly Cited
2002
Highly Cited
2002
Template Growth of Photoconductive Metal−CdSe−Metal Nanowires
Metal−CdSe−metal (metal = Au, Ni) nanowires were grown by electrochemical replication of porous aluminum oxide and polycarbonate… 
Highly Cited
1999
Highly Cited
1999
Printing Process Suitable for Reel-to-Reel Production of High-Performance Organic Transistors and Circuits
cause appropriate compounds now exist for many types of devices, research has expanded to include patterning methods that can… 
Highly Cited
1999
Highly Cited
1999
Formation of low resistance Pt ohmic contacts to p-type GaN using two-step surface treatment
Two-step surface treatment is introduced to obtain low resistance Pt contacts to p-type GaN. The first step is performed after… 
Highly Cited
1998
Highly Cited
1998
Reduction of Etch Pit Density in Organometallic Vapor Phase Epitaxy-Grown GaN on Sapphire by Insertion of a Low-Temperature-Deposited Buffer Layer between High-Temperature-Grown GaN
The etch pit density of organometallic vapor phase epitaxy (OMVPE)-grown GaN on sapphire was discovered to reduce drastically by… 
Highly Cited
1993
Highly Cited
1993
TMAH/IPA anisotropic etching characteristics
Highly Cited
1993
Highly Cited
1993
Fabrication of silicon nanostructures with a scanning tunneling microscope
A technique is presented for fabricating Si nanostructures with a scanning tunneling microscope operated in air. The process… 
Highly Cited
1985
Highly Cited
1985
Development of the Self-Aligned Titanium Silicide Process for VLSI Applications
A manufacturable self-aligned titanium silicide process which simultaneously silicides both polysilicon gates and junctions has… 
Review
1985
Review
1985
Thermal nitridation of Si and SiO2for VLSI
This paper presents an extensive review of our work on thermal nitridation of Si and SiO2. High-quality ultrathin films of… 
Highly Cited
1979
Highly Cited
1979
Some chemical aspects of the fluorocarbon plasma etching of silicon and its compounds
Mass spectrometric sampling of fluorocarbon glow discharges and in situ measurements of the etch rate of Si and SiO2, with quartz… 
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