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Black's equation

Known as: Black equation 
Black's Equation is a mathematical model for the mean time to failure (MTTF) of a semiconductor circuit due to electromigration: a phenomenon of… Expand
Wikipedia

Related topics

Related topics

2 relations
Electromigration

Broader (1)

Electronic design automation

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2017
2017
Thermo-electric coupling reliability model of copper pillar bump based on Black equation
In order to investigate the reliability of micro-interconnecting copper pillar bump under thermal-electric coupling, the test… Expand
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2016
2016
Voltage-based electromigration immortality check for general multi-branch interconnects
As VLSI technology features are pushed to the limit with every generation and with the introduction of new materials and… Expand
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2012
2012
Electromigration measurements in thin-film IPD and eWLB interconnections
In this paper we describe measurements of electromigration failure times in the metal traces of silicon Integrated Passive… Expand
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2011
2011
Analysis of critical-length data from Electromigration failure studies
  • V. Dwyer
  • Microelectron. Reliab.
  • 2011
    • Corpus ID: 27096642
Abstract An accurate estimation of the Blech length, the critical line length below which interconnect lines are immortal, is… Expand
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2011
2011
Black's equation for today's ULSI interconnect Electromigration reliability — A revisit
  • Wei Li, Cher Ming Tan
  • IEEE International Conference of Electron Devices…
  • 2011
    • Corpus ID: 20223701
Electromigration (EM) is an important failure mechanism in Ultra-Large-Scale Integration (ULSI) interconnections. The Black's… Expand
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Review
2010
Review
2010
Physically based models of electromigration: From Black's equation to modern TCAD models
Electromigration failure is a major reliability concern for integrated circuits. The continuous shrinking of metal line… Expand
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2008
2008
Effects of length scaling on electromigration in dual-damascene copper interconnects
Abstract The electromigration short-length effect in dual-damascene Cu interconnects has been investigated through experiments on… Expand
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2007
2007
Unusual fluorescence emission characteristics from europium-doped lead phosphate glass caused by 3 MeV proton irradiation
In 1951, Birks and Black showed experimentally that the fluorescence efficiency of anthracene bombarded by alphas varies with… Expand
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2005
2005
Lead-Free and PbSn Bump Electromigration Testing
As the electronics industry continues to push for miniaturization, several reliability factors become vital issues. The demand… Expand
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1979
1979
Job Change Behavior in the Rural Income Maintenance Experiment. Institute for Research on Poverty Discussion Papers.
kindly commented on an earlier draft. A considerable debt is owed to Professor Seymour Spi1erman for the· gUidance provided by a… Expand
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