titanium disilicide

 

Topic mentions per year

Topic mentions per year

1984-2015
012319842015

Papers overview

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2016
2016
We elucidate here the mechanistic contribution of a novel electroconductive hydroxyapatite-20 wt.% titanium disilicide (HA-TiSi2… (More)
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2015
2015
In this paper, titanium film thickness in the range of 40nm to 125nm was characterized for optimizing the thickness-temperature… (More)
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2012
2012
The discovery of new materials has played an important role in battery technology development. Among the newly discovered… (More)
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2011
2011
The titanium disicilicate (TiSi(2)) nanonet is a material with a unique two-dimensional morphology and has proven beneficial for… (More)
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2007
2007
Understanding the growth mechanisms of nanowires is essential for their successful implementation in advanced devices… (More)
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2000
2000
  • 2000
The titanium silicide thin films had been formed on Si substrate by reacting of TiX4 (X=Cl, Br) with Si under different… (More)
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1999
1999
Microstructural study of the C49-TiSi, to C54-TiSi, polymorphic transformation has been performed to elucidate microstructural… (More)
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1996
1996
Low-temperature poly-Si TFT's using titanium disilicide contacts for source and drain have been fabricated. Titanium disilicide… (More)
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1992
1992
The silicide growth over the spacers (bridging) in the conventional self-aligned silicide process using titanium disilicide is… (More)
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1986
1986
An As-P double-diffused lightly doped drain (LDD) device has been designed and fabricated with a self-aligned titanium disilicide… (More)
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