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tetrakis(dimethylamido)titanium

 
National Institutes of Health

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Organometallic Compounds

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2019
2019
In Situ Photoluminescence of Colloidal Quantum Dots During Gas Exposure - The Role of Water and Reactive Atomic Layer Deposition Precursors.
Colloidal quantum dots (QDs) are a promising material for optoelectronic applications. Typically, device integration requires QDs… Expand
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2015
2015
Chemical Stability of Titania and Alumina Thin Films Formed by Atomic Layer Deposition.
Thin films formed by atomic layer deposition (ALD) are being examined for a variety of chemical protection and diffusion barrier… Expand
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2014
2014
Quantitative Infrared Spectroscopy of Tetrakis(dimethylamido)Titanium for Process Measurements
In situ infrared (IR) spectroscopy has proven to be an extremely valuable tool for understanding various aspects of chemical… Expand
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2014
2014
Towards a comprehensive understanding of the chemical vapor deposition of titanium nitride using Ti(NMe2)4: a density functional theory approach.
A gas phase mechanistic investigation of the chemical vapor deposition (CVD) of titanium nitride (TiN) from the decomposition of… Expand
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2011
2011
Tuning the reactivity of semiconductor surfaces by functionalization with amines of different basicity.
Surface functionalization of semiconductors has been the backbone of the newest developments in microelectronics, energy… Expand
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2006
2006
A supersonic molecular beam study of the reaction of tetrakis(dimethylamido)titanium with self-assembled alkyltrichlorosilane monolayers.
The reaction of a transition metal coordination complex, Ti[N(CH(3))(2)](4), with self-assembled monolayers (SAMs) possessing-OH… Expand
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2005
2005
The reaction of tetrakis(dimethylamido)titanium with self-assembled alkyltrichlorosilane monolayers possessing -OH, -NH2, and -CH3 terminal groups.
The reactions of tetrakis(dimethylamido)titanium, Ti[N(CH(3))(2)](4), with alkyltrichlorosilane self-assembled monolayers (SAMs… Expand
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2005
2005
Covalent attachment of a transition metal coordination complex to functionalized oligo(phenylene-ethynylene) self-assembled monolayers.
We have investigated the reaction of tetrakis(dimethylamido)titanium, Ti[N(CH(3))(2)](4), with N-isopropyl-N-[4-(thien-3… Expand
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1998
1998
Chemical rate model for the surface pyrolysis of tetrakis(dimethylamido)titanium to form titanium nitride films
A chemical kinetic rate model for the deposition of titanium nitride films from the surface reaction of tetrakis(dimethyl-amido… Expand
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1996
1996
Atmospheric pressure chemical vapor deposition of TiN from tetrakis(dimethylamido)titanium and ammonia
Near stoichiometric titanium nitride (TiN) was deposited from tetrakis(dimethylamido)titanium (TDMAT) and ammonia using… Expand
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