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tetrakis(dimethylamido)titanium

 
National Institutes of Health

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2019
2019
Colloidal quantum dots (QDs) are a promising material for optoelectronic applications. Typically, device integration requires QDs… Expand
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2015
2015
Thin films formed by atomic layer deposition (ALD) are being examined for a variety of chemical protection and diffusion barrier… Expand
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2014
2014
In situ infrared (IR) spectroscopy has proven to be an extremely valuable tool for understanding various aspects of chemical… Expand
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2014
2014
A gas phase mechanistic investigation of the chemical vapor deposition (CVD) of titanium nitride (TiN) from the decomposition of… Expand
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2011
2011
Surface functionalization of semiconductors has been the backbone of the newest developments in microelectronics, energy… Expand
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2006
2006
The reaction of a transition metal coordination complex, Ti[N(CH(3))(2)](4), with self-assembled monolayers (SAMs) possessing-OH… Expand
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2005
2005
The reactions of tetrakis(dimethylamido)titanium, Ti[N(CH(3))(2)](4), with alkyltrichlorosilane self-assembled monolayers (SAMs… Expand
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2005
2005
We have investigated the reaction of tetrakis(dimethylamido)titanium, Ti[N(CH(3))(2)](4), with N-isopropyl-N-[4-(thien-3… Expand
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1998
1998
A chemical kinetic rate model for the deposition of titanium nitride films from the surface reaction of tetrakis(dimethyl-amido… Expand
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1996
1996
Near stoichiometric titanium nitride (TiN) was deposited from tetrakis(dimethylamido)titanium (TDMAT) and ammonia using… Expand
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