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fluoroform

Known as: CHF3, trifluoromethane 
National Institutes of Health

Related topics

Related topics

4 relations

Broader (1)

Chlorofluorocarbons, Methane

Narrower (2)

FC-23fluorocarbon-11
Freons

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2009
2009
The Mobility of Negative Ions in CF3I, CF3I-N2, CF3I-Ar, CF3I-Xe, C2F6, and CHF3, and of Positive Ions in C2F4 and c-C4F8
Using a pulsed Townsend technique, the drift velocity and the mobility of positive ions in C 2 F 4 and C 4 F 8 and those of… 
2004
2004
Synthesis of Trifluoromethanesulfonic Acid from CHF3
Trifluoromethane is transformed to trifluoromethanesulfonic acid (TFMSA) at low temperature in a liquid-phase reaction in a… 
2003
2003
Indium Phosphide Based Optical Micro-Ring Resonators
Title of Dissertation: INDIUM PHOSPHIDE BASED OPTICAL MICRO-RING RESONATORS Rohit Grover, Doctor of Philosophy, 2003 Dissertation… 
2002
2002
Low-energy electron scattering by CH3F, CH2F2, CHF3, and CF4
We present measured and calculated differential cross sections, as well as calculated integral cross sections, for elastic… 
2002
2002
BIOCATALYTIC TREATMENT OF ORGANOSULFUR COMPOUNDS IN EMULSIONS IN SUPERCRITICAL FLUIDS
Introduction Sulfur levels in refinery crude oil feedstocks are increasing annually, while at the same time, federal and local… 
2001
2001
Temperature and density dependent solute vibrational relaxation in supercritical fluoroform
Temperature- and density-dependent vibrational relaxation data for the v6 asymmetric stretch of W(CO)6 in supercritical… 
2000
2000
A generalized model for viscosity and thermal conductivity of trifluoromethane (R-23)
A model for the calculation of the viscosity and thermal conductivity of trifluoromethane (R-23), expressed in terms of… 
2000
2000
A fundamental equation for the calculation of the thermodynamic properties of trifluoromethane (R-23)
A formulation for the thermodynamic properties of trifluoromethane (R-23) is presented. The equation is valid for single-phase… 
1998
1998
ELECTRON INTERACTIONS WITH PLASMA PROCESSING GASES
To assess the behavior of gases in their uses in manufacturing semiconductor devices and other applications and to promote the… 
Highly Cited
1979
Highly Cited
1979
High resolution, steep profile, resist patterns
High resolution and steep profile patterns have been generated in a 2.6-μm thick organic layer which conforms to the steps on a… 
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