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dichlorosilane

Known as: SiH2Cl2 
National Institutes of Health

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Silanes

Papers overview

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2016
2016
Experimental and theoretical rationalization of the growth mechanism of silicon quantum dots in non-stoichiometric SiNx: role of chlorine in plasma enhanced chemical vapour deposition
Silicon quantum dots (Si-QDs) embedded in an insulator matrix are important from a technological and application point of view… 
2012
2012
Mushroom-Free Selective Epitaxial Growth of Si, SiGe and SiGe:B Raised Sources and Drains on FD-SOI MOSFETs
2011
2011
Synthesis of a base-stabilized 1-hydrosilanimine via NHC-mediated dehydrohalogenation of hydrochlorosilane.
  • H. CuiC. Cui
  • Chemistry - An Asian Journal
  • 2011
  • Corpus ID: 21690940
2010
2010
Reactions of hydridochlorosilanes with 2,2'-bipyridine and 1,10-phenanthroline: complexation versus dismutation and metal-catalyst-free 1,4-hydrosilylation.
Stable in the solid state and isolable in high yields are adducts of H(2)SiCl(2), HSiCl(3), and RSiCl(3) (R = Me, Ph) with the N… 
2006
2006
Stress control of polycrystalline 3C-SiC films in a large-scale LPCVD reactor using 1,3-disilabutane and dichlorosilane as precursors
Control of residual stress and strain gradient of polycrystalline SiC films deposited via low-pressure chemical vapor deposition… 
2001
2001
Conformational equilibria, Raman and infrared spectra andab initio calculations of dichloromethylmethyldichlorosilane
The infrared spectra of dichloromethylmethyldichlorosilane (Cl2CHCH3SiCl2) were recorded in the vapour, amorphous and partly… 
2001
2001
Trends in Nanotechnology: Self-Assembly and Defect Tolerance
In this paper we discuss the concept of using self-assembly coupled with novel switching elements and a defect-tolerant… 
1998
1998
INTRINSIC MICROCRYSTALLINE SILICON BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION FROM DICHLOROSILANE
Microcrystalline silicon (μc-Si:H) of truly intrinsic character can be deposited by plasma-enhanced chemical vapor deposition… 
1997
1997
Intermediate products of the chain oxidation of dichlorosilane
The reaction of dichlorosilane oxidation in a flow reactor at a low pressure and room temperature is found to oscillate under… 
1996
1996
Characterization of self-limiting SiH2Cl2 chemisorption and photon-stimulated desorption as elementary steps for Si atomic-layer epitaxy.
  • Akazawa
  • Physical Review B (Condensed Matter)
  • 1996
  • Corpus ID: 9925862
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