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Wil Shipley
William "Wil" Jon Shipley (born October 16, 1969) is a Macintosh software developer, best known for co-founding and heading The Omni Group in 1991…
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4 relations
Apple Rhapsody
NeXTSTEP
OmniGraffle
OmniWeb
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2015
2015
The Alter-Imperial Paradigm: Empire Studies & the Book of Revelation
S. Wood
2015
Corpus ID: 163117436
In The Alter-Imperial Paradigm Shane J. Wood examines the socio-historical context of Revelation from an imperial subject's…
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2012
2012
Photoresist surface roughness characterization in additive lithography processes for fabrication of phase-only optical vortices
M. Poutous
,
Zahra Hosseinimakarem
,
E. Johnson
2012
Corpus ID: 124916852
Abstract. Roughness on the surface of phase-only micro-optical elements limits their performance. An optical vortex phase element…
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2011
2011
Optimized photolithographic fabrication process for carbon nanotube devices
S. Khamis
,
Ryan A. Jones
,
A. T. Johnson
2011
Corpus ID: 2448277
We have developed a photolithographic process for the fabrication of large arrays of single walled carbon nanotube transistors…
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2010
2010
New photoresist coating method for high topography surfaces
K. Zandi
,
Ying Zhao
,
J. Schneider
,
Y. Peter
IEEE/LEOS International Conference on Optical…
2010
Corpus ID: 20807007
A novel technique of photoresist coating, Dynamic Surface Tension (DST) coating, is presented. This technique is particularly…
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Review
2000
Review
2000
Defects and metrology of ultrathin resist films
U. Okoroanyanwu
,
J. Cobb
,
+5 authors
C. L. Pike
Advanced Lithography
2000
Corpus ID: 135802494
Defectivity in spin-coated, but unpatterned ultrathin resist (UTR) films (<EQ 1000 Angstrom) was studied in order to determine…
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1993
1993
Photolithographic micromolding of ceramics using plasma etched polyimide patterns
J. A. Bride
,
Suresh Baskaran
,
+4 authors
Matthew O'Donnell
1993
Corpus ID: 38624176
Features as fine as 4 μm with high aspect ratio were produced from ceria‐zirconia ceramic using a thick plasma‐etched polyimide…
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1992
1992
keV x-ray source based on high-repetition-rate excimer-laser-produced plasmas (Poster Paper)
R. Fedosejevs
,
R. Bobkowski
,
J. Broughton
,
B. Harwood
Advanced Lithography
1992
Corpus ID: 135629269
A keV x-ray source based on plasma production using a high repetition rate picosecond KrF laser has been developed. By using a…
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1990
1990
Meet the challenge, make the change 2
J. Mooijman
1990
Corpus ID: 193173430
Het eerste deel van dit artikel ging over de wankele basis van het vorig jaar verschenen Advies over de voorlopige eindtermen…
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1989
1989
Modeling and Simulation of Multiple Chemical States in Photoresist Materials
R. Ferguson
,
C. Spence
,
Y. Shacham-Diamand
,
A. Neureuther
Advanced Lithography
1989
Corpus ID: 96291851
A general approach to the modeling and simulation of advanced resist systems that rely on transitions between multiple chemical…
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1985
1985
Fabrication of monolithically Peltier-cooled linear laser diodes using wet chemical etching
S. Hava
,
R. Hunsperger
IEEE Transactions on Electron Devices
1985
Corpus ID: 44807450
The basic structure of a monolithically Peltier-cooled laser (MPCL) diode has been fabricated. The process of forming the…
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