Skip to search form
Skip to main content
Skip to account menu
Semantic Scholar
Semantic Scholar's Logo
Search 236,511,323 papers from all fields of science
Search
Sign In
Create Free Account
Reticle Device Component
Known as:
Reticle
A grid or pattern in the eyepiece of an optical device designed to establish a scale or position reference.
National Institutes of Health
Create Alert
Alert
Related topics
Related topics
1 relation
Medical Device Component or Accessory
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
Review
2017
Review
2017
Prospects for Electronic Photonic Integration
K. Williams
2017
Corpus ID: 85534169
As InP integrated photonic circuits increase in complexity, component density, and circuit performance, electronic circuits need…
Expand
2015
2015
A 60 GHz single-chip 256-element wafer-scale phased array with EIRP of 45 dBm using sub-reticle stitching
S. Zihir
,
O. Gurbuz
,
A. Karroy
,
S. Raman
,
Gabriel M. Rebeiz
Radio Frequency Integrated Circuits Symposium
2015
Corpus ID: 15740096
This paper presents a 60 GHz wafer-scale transmit phased-array with 256-elements spaced λ/2 apart in the x and y directions, and…
Expand
Review
2013
Review
2013
Mask characterization for critical dimension uniformity budget breakdown in advanced extreme ultraviolet lithography
P. Nikolsky
,
C. Strolenberg
,
+7 authors
J. Yeo
2013
Corpus ID: 122399423
Abstract. As the International Technology Roadmap for Semiconductors critical dimension uniformity (CDU) specification shrinks…
Expand
2008
2008
Visual Double Star Measurements with an Alt-Azimuth Telescope
Thomas G. Frey
2008
Corpus ID: 55364274
An alt-az mounted Newtonian telescope was used to determine the separation and position angle of seven known and five neglected…
Expand
Review
2003
Review
2003
Enhanced dispositioning of reticle defects for advanced masks using virtual stepper with automated defect severity scoring
L. Pang
,
Alex Lu
,
Jessie Y.C. Chen
,
Eric Guo
,
L. Cai
,
Jiunn-Hung Chen
SPIE Photomask Technology
2003
Corpus ID: 108438144
As the semiconductor industry continues to scale down critical dimensions (CD), proximity effects get more and more severe. As…
Expand
2003
2003
Application of optical fibres in precision heterodyne laser interferometry
Bawh Bastiaan Knarren
2003
Corpus ID: 106975708
In the semi-conductor industry the photo-lithography, which is performed with a wafer scanner, is one of the critical production…
Expand
Review
2002
Review
2002
High Precision Photomask Polishing with Magneto-Rheological Finishing ( MRF )
M. Tricard
,
D. Golini
2002
Corpus ID: 6264560
The December 2001 edition of the International Technology Roadmap for Semiconductors (ITRS) makes it abundantly clear that…
Expand
1999
1999
Reticle defect size calibration using low-voltage SEM and pattern recognition techniques for sub-200-nm defects
L. Zurbrick
,
S. Khanna
,
J. Lee
,
J. Greed
,
Ellen R. Laird
,
Rene M. Blanquies
Photomask Technology
1999
Corpus ID: 110305060
Programmed defect test reticles are required to characterize automatic defect inspection equipment. In order to perform…
Expand
1995
1995
Air-turbulence-compensated interferometer for IC manufacturing
S. Lis
Advanced Lithography
1995
Corpus ID: 109982477
SPARTA has developed a novel dual wavelength interferometer which is directly aimed at stepper stage control and general IC…
Expand
1986
1986
Histomorphometric study on growing condyle of rat.
S. Suzuki
The Bulletin of Tokyo Medical and Dental…
1986
Corpus ID: 24960960
The purpose of this study was to carry out the histomorphometric assay on the mandibular condylar tissue of the growing rats…
Expand