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NisI protein, Lactococcus lactis

Known as: nisin immunity protein, Lactococcus lactis 
National Institutes of Health

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3 relations

Broader (3)

Bacterial ProteinsLipoproteinsMembrane Proteins

Papers overview

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2011
2011
Exact control of junction position and Schottky barrier height in dopant-segregated epitaxial NiSi2 for high performance metal source/drain MOSFETs
This paper reports junction position control and the Schottky barrier height (Ф<inf>Bn</inf>) tuning in ultrathin SOI MOSFETs… 
2011
2011
Fast growth of branched nickel monosilicide nanowires by laser-assisted chemical vapor deposition
Branched nickel monosilicide (NiSi) nanowires (NWs), for the first time, have been synthesized on Ni foams by laser-assisted… 
Highly Cited
2009
Highly Cited
2009
Homogeneous nucleation of epitaxial CoSi2 and NiSi in Si nanowires.
Homogeneous nucleation is rare except in theory. We observed repeating events of homogeneous nucleation in epitaxial growth of… 
2007
2007
NiSi Polysilicon Fuse Reliability in 65-nm Logic CMOS Technology
The programming characteristics and reliability of NiSi polysilicon fuse fabricated using 65-nm logic complimentary metal-oxide… 
2005
2005
45-nm node NiSi FUSI on nitrided oxide bulk CMOS fabricated by a novel integration process
  • S. YuJ.P. Lu B. McKee
  • IEEE InternationalElectron Devices Meeting…
  • 2005
  • Corpus ID: 6948228
Bulk CMOS transistors with NiSi fully silicided gate electrodes (FUSI) on plasma nitrided oxide gate dielectric are fabricated by… 
2004
2004
Drastic suppression of thermally induced leakage of NiSi silicided shallow junctions by pre-SALICIDE fluorine implantation
Thermally unstable NiSi films on shallow junctions are known to induce large leakage current on heat stimulus. Thus, a sensitive… 
2003
2003
Nickel vs. cobalt silicide integration for sub-50nm CMOS
In this work, NiSi SALICIDE has been fully integrated with sub-50 nm gate length transistors and compared to its CoSi/sub 2… 
2003
2003
Formation of NiSi-silicided p+n shallow junctions using implant-through-silicide and low-temperature furnace annealing
NiSi-silicided p + n shallow junctions are fabricated using BF + 2 implantation into/through thin NiSi silicide layer (implant… 
1936
1936
Über die mikroskopisch heterogene Reaktionsweise von Fasern
ZusammenfassungDer klassische Satz „corpora non agunt nisi fluida“ gilt für die Zellulose nicht. Sie kann dank ihrer… 
1933
1933
Die endoparasitische Deutonymphe vonPterolichus nisi
  • H. Vitzthum
  • Zeitschrift für Parasitenkunde
  • 1933
  • Corpus ID: 11600642
ZusammenfassungDie bei den freilebenden Tyroglyphen auftretenden heteromorphen Deutonymphen sind im Laufe der Jahre in einer… 
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