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NGL (programming language)

Known as: NGL, NGL programming language 
NGL (short for aNGeL) is a function-level array programming language featuring an iconical mathematical notation and tuple pattern matching. NGL was… 
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Related topics

Related topics

8 relations
Array programmingBioinformaticsData miningFunction-level programming

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2015
2015
Optical lithography with and without NGL for single-digit nanometer nodes
  • B. Lin
  • Advanced Lithography
  • 2015
  • Corpus ID: 120341479
This presentation addresses the challenges to pattern single-digit nanometer nodes. Next generation lithography such as Extreme… 
2013
2013
Reflective electron beam lithography: lithography results using CMOS controlled digital pattern generator chip
Maskless electron beam lithography can potentially extend semiconductor manufacturing to the 10 nm logic (16 nm half pitch… 
2013
2013
Design and optimization of heat integrated dividing wall columns for improved debutanizing and deisobutanizing fractionation of NGL
Dividing wall columns, capable of reducing the energy required for the separation of ternary mixtures, were explored for the… 
Review
2011
Review
2011
Next-generation lithography for 22 and 16 nm technology nodes and beyond
In this paper, next-generation lithography (NGL) for the 22 and 16 nm technology nodes and beyond is reviewed. A broad range of… 
2009
2009
Short-term supply chain management in upstream natural gas systems
Natural gas supply chain planning and optimization is important to ensure security and reliability of natural gas supply. However… 
Highly Cited
2007
Highly Cited
2007
World oil depletion Models : Price effects compared with strategic or technological interventions
2005
2005
Nanoimprint lithography: the path toward high-tech, low-cost devices (Keynote Paper)
Nanoimprint lithography is a contact-lithography technology invented in 1996 as a low-cost alternative to photolithography for… 
2001
2001
Analysis of Multilayer Structure for Reflection of Extreme-Ultraviolet Wavelength
Mo/Si multilayers deposited by sputtering for application to extreme-ultraviolet (EUV) reflectors have been characterized. Since… 
Review
2000
Review
2000
Overview of the ion projection lithography European MEDEA and international program
Ion Projection Lithography (IPL) follows the same principle as optical wafer steppers when using hydrogen or helium ions for the… 
1980
1980
A Nuclear Detector Gain Stabilizing Technique with Only One Stable Gain Position
A nuclear radiation detector gain stabilizing scheme has been developed which offers the unique advantage of having only one… 
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