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KLA peptide

Known as: (KLAKLAK)2, (Lys-Leu-Ala-Lys-Leu-Ala-Lys)2 
National Institutes of Health

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Peptides

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2019
2019
Mechanism of reducing knee adduction moment by shortening of the knee lever arm via medio-lateral manipulation of foot center of pressure: A pilot study.
2012
2012
Reticle intensity-based critical dimension uniformity to improve efficiency for DOMA correction in a foundry
As transistor dimensions shrinks, the requirement for wafer critical dimensions control is becoming increasingly challenging. The… 
2012
2012
Defect inspection challenges and solutions for ultra-thin SOI
This paper will explain the challenges and solutions for ultra thin SOI inspection using a laser light scattering based system… 
2010
2010
Process Window Centering for 22 nm lithography
PWC (Process Window Centering) is an efficient methodology to validate or adjust and center the overall process window for a… 
2008
2008
High resolution defect inspection of step and flash imprint lithography for 32 nm half-pitch patterning
Imprint lithography has been shown to be an effective method for the replication of nanometer-scale structures from an imprint… 
2007
2007
Defect reduction progress in step and flash imprint lithography
Imprint lithography has been shown to be an effective method for the replication of nanometer-scale structures from a template… 
2007
2007
Study on photochemical analysis system (VLES) for EUV lithography
A system for photo-chemical analysis of EUV lithography processes has been developed. This system has consists of 3 units: (1) an… 
2004
2004
Full-field wafer level thin film stress measurement by phase-stepping shadow Moire/spl acute/
A wafer topography measurement system has been designed and demonstrated based on shadow Moire/spl acute/. Three-step phase… 
2004
2004
Phase defect printability and mask inspection capability of 65-nm technology node Alt-PSM for ArF lithography (Photomask Japan Best Paper)
The increase of MEEF(Mask Error Enhancement Factor) as well as the life prolonging of the ArF lithography with low k1 makes the… 
2002
2002
Cr photomask etch performance and its modeling
Mathematical prediction of dry etch results have been difficult, if not impossible, over the years due to the complexity inherent… 
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