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Illuminator (backlight)
Known as:
Casio illuminator
, Illuminator
Illuminator is an LCD backlight technology used in some Casio watches. The Timex corporation has its own similar technology called Indiglo. Casio…
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Semantic Scholar uses AI to extract papers important to this topic.
2014
2014
Single-antenna ATSC passive radar observations with remodulation and keystone formatting
W. Barott
,
J. Engle
International Radar Conference
2014
Corpus ID: 45593496
This paper describes passive radar observations using the ATSC digital television signal as an illuminator. The system has two…
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2012
2012
Electromagnetic Models for Passive Tag-to-Tag Communications
G. Marrocco
,
S. Caizzone
IEEE Transactions on Antennas and Propagation
2012
Corpus ID: 37319255
The UHF passive radio frequency identification technology generally enables an asymmetric interaction between the reader and the…
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2009
2009
DLP hyperspectral imaging for surgical and clinical utility
K. Zuzak
,
Robert P. Francis
,
+6 authors
E. Livingston
MOEMS-MEMS
2009
Corpus ID: 131627545
We describe a novel digital light processing, DLP hyperspectral imaging system for visualizing chemical composition of in vivo…
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2006
2006
Integrated projecting optics tester for inspection of immersion ArF scanner
T. Fujii
,
Kosuke Suzuki
,
Yasushi Mizuno
,
N. Kita
SPIE Advanced Lithography
2006
Corpus ID: 128546698
Immersion lithography has been intensively developed to print features, such as isolated lines and isolated spaces, which are…
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2005
2005
A Real-Time Driver Visual Attention Monitoring System
Jorge Batista
Iberian Conference on Pattern Recognition and…
2005
Corpus ID: 2438083
This paper describes a framework for analyzing video sequences of a driver and determining his level of attention. The proposed…
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2004
2004
Impact of measured pupil illumination fill distribution on lithography simulation and OPC models
C. Bodendorf
,
R. Schlief
,
R. Ziebold
SPIE Advanced Lithography
2004
Corpus ID: 110432612
Increasing miniaturization and decreasing k1 factors impose continuously growing demands on optical lithography. These…
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2003
2003
Rates and mechanisms of optic contamination in the EUV engineering test stand
P. Grunow
,
L. Klebanoff
,
S. Graham
,
S. Haney
,
W. M. Clift
SPIE Advanced Lithography
2003
Corpus ID: 137054674
The EUV Engineering Test Stand (ETS) is a full field, alpha class Extreme Ultraviolet Lithography (EUVL) tool that has…
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2001
2001
Impact of the EUV mask phase response on the asymmetry of Bossung curves as predicted by rigorous EUV mask simulations
C. Krautschik
,
Masaaki Ito
,
I. Nishiyama
,
K. Otaki
SPIE Advanced Lithography
2001
Corpus ID: 121819759
EUV masks generally mandate rigorous scattering models as the thickness to wavelength ratio is typically on the order of 30:1. In…
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1989
1989
Shape understanding from Lambertian photometric flow fields
L. B. Wolff
Proceedings CVPR '89: IEEE Computer Society…
1989
Corpus ID: 12569547
A novel idea for the analysis of shape from reflectance maps is introduced. It is shown that local surface orientation and…
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1976
1976
Creation and imitation : the work of a fifteenth-century manuscript illuminator
J. Farquhar
1976
Corpus ID: 191450089
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