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Explanation-based learning

Known as: EBL, Explanation based learning 
'Explanation-based learning (EBL)is a form of machine learning that exploits a very strong, or even perfect, domain theory to make generalizations or… 
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Related topics

Related topics

4 relations
Domain theoryFirst Order Inductive LearnerMedSLT

Broader (1)

Machine learning

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2013
2013
Nanolithography by scanning probes on calixarene molecular glass resist using mix-and-match lithography
Abstract. Going “beyond the CMOS information-processing era,” taking advantage of quantum effects occurring at sub-10-nm level… 
Highly Cited
2013
Highly Cited
2013
THE FIRM REDSHIFT LOWER LIMIT OF THE MOST DISTANT TeV-DETECTED BLAZAR PKS 1424+240
We present the redshift lower limit of z ⩾ 0.6035 for the very high energy (VHE; E ⩾ 100 GeV) emitting blazar PKS 1424+240 (PG… 
2011
2011
Optimized photolithographic fabrication process for carbon nanotube devices
We have developed a photolithographic process for the fabrication of large arrays of single walled carbon nanotube transistors… 
Highly Cited
2010
Highly Cited
2010
THE RESOLVED NEAR-INFRARED EXTRAGALACTIC BACKGROUND
We present a current best estimate of the integrated near-infrared (NIR) extragalactic background light (EBL) attributable to… 
2009
2009
CONSTRAINTS ON THE EXTRAGALACTIC BACKGROUND LIGHT FROM VERY HIGH ENERGY GAMMA-RAY OBSERVATIONS OF BLAZARS
The extragalactic background light (EBL) from the infrared to the ultraviolet is difficult to measure directly, but can be… 
Highly Cited
2008
Highly Cited
2008
VERITAS OBSERVATIONS OF THE BL LAC OBJECT 1ES 1218+304
The VERITAS collaboration reports the detection of very-high-energy gamma-ray emission from the high-frequency-peaked BL Lac… 
Highly Cited
2005
Highly Cited
2005
6 nm half-pitch lines and 0.04 µm2 static random access memory patterns by nanoimprint lithography
A key issue in nanoimprint lithography (NIL) is determining the ultimate pitch resolution achievable for various pattern shapes… 
Highly Cited
2005
Highly Cited
2005
Electron beam lithography patterning of sub-10 nm line using hydrogen silsesquioxane for nanoscale device applications
We investigated novel patterning techniques to produce ultrafine patterns for nanoscale devices. Hydrogen silsesquioxane (HSQ… 
Highly Cited
2003
Highly Cited
2003
High quality Nb-based tunnel junctions for high frequency and digital applications
A number of new fabrication techniques are developed and optimized in order to fit the requirements of contemporary… 
Highly Cited
1992
Highly Cited
1992
A Statistical Approach to Solving the EBL Utility Problem
Many "learning from experience" systems use information extracted from problem solving experiences to modify a performance… 
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