Cymer
National Institutes of Health
Papers overview
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In response to significant neon supply constraints, Cymer has responded with a multi-part plan to support its customers. Cymer’s…
Leading-edge scanners in fabs worldwide have particularly high system utilization and require peak levels of system throughput…
Tighter CD control requirements of the smaller devices in modern semiconductor products demand control of all potential sources…
Dynamics of laser-produced Sn-based plasmas were investigated for a monochromatic EUV lithography (EUVL) source. A hollow plasma…
As Argon Fluoride (ArF) lithography moves into high volume production, ArF light sources need to meet performance requirements…
We report on the approach for a high-power high-beam-quality drive laser system that is used for a laser-produced plasma (LPP…
This paper will summarize over 10 years of solid state pulsed power development at Cymer Inc. associated with power systems for…
Over the past several years, a continuous improvement of the performance parameters of discharge produced plasmas as potential…
Recent advances in the Dense Plasma Focus (DPR) under investigation by Cymer as an EUV light source have increased both the total…