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Cymer

National Institutes of Health

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ranimustine

Papers overview

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2017
2017
CymeR: cytometry analysis using KNIME, docker and R
Summary: Here we present open‐source software for the analysis of high‐dimensional cytometry data using state of the art… 
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2017
2017
Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching
Extreme ultraviolet (EUV) lithography produces 13.5 nm light by irradiating a droplet of molten Sn with a laser, creating a dense… 
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2016
2016
Dynamic hysteresis in a coherent high-β nanolaser
The quest for an integrated light source that promises high energy efficiency and a fast modulation for high-performance photonic… 
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2016
2016
Observation of second-harmonic generation in silicon nitride waveguides through bulk nonlinearities.
We present experimental results on the observation of a bulk second-order nonlinear susceptibility, derived from both free-space… 
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Review
2012
Review
2012
Optofluidic devices and applications in photonics, sensing and imaging.
Optofluidics integrates the fields of photonics and microfluidics, providing new freedom to both fields and permitting the… 
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2011
2011
Micro-resonator with metallic mirrors coupled to a bus waveguide.
We demonstrate a micro-resonator based on a channel waveguide terminated with metallic mirrors side coupled to a bus waveguide… 
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2009
2009
Laser-produced plasma light source for EUVL
This paper is devoted to the development of laser produced plasma (LPP) EUV source architecture for advanced lithography… 
2009
2009
Lithography line productivity impact using Cymer GLX technology
Leading-edge scanners in fabs worldwide have particularly high system utilization and require peak levels of system throughput… 
2008
2008
Hypersensitive parameter-identifying ring oscillators for lithography process monitoring
This paper applies process and circuit simulation to examine plausible explanations for measured differences in ring oscillator… 
2005
2005
EUV source system development update: advancing along the path to HVM
The EUV light source has been characterized as the top-priority critical issue facing the viability of EUV lithography. Cymer's… 
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