Cymer

 
National Institutes of Health

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2016
2016
CymeR: cytometry analysis using KNIME, docker and R
Summary Here we present open-source software for the analysis of high-dimensional cytometry data using state of the art… (More)
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Review
2016
Review
2016
How does a β-barrel integral membrane protein insert into the membrane?
Integral membrane proteins (MPs) are categorized into two major groups: transmembrane (TM) α-helical bundles and β-barrels (Cymer… (More)
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2016
2016
Dynamic hysteresis in a coherent high-β nanolaser
The quest for an integrated light source that promises high energy efficiency and a fast modulation for high-performance photonic… (More)
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2011
2011
Micro-resonator with metallic mirrors coupled to a bus waveguide.
We demonstrate a micro-resonator based on a channel waveguide terminated with metallic mirrors side coupled to a bus waveguide… (More)
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2008
2008
Hypersensitive parameter-identifying ring oscillators for lithography process monitoring
This paper applies process and circuit simulation to examine plausible explanations for measured differences in ring oscillator… (More)
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2005
2005
Loss Estimation of Capacitor in High Rep-Rate Pulsed Power System
Capacitor loss in pulsed power systems has become an important issue for thermal management, especially when the operating rep… (More)
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2004
2004
A decade of solid state pulsed power development at Cymer Inc.
This paper will summarize over 10 years of solid state pulsed power development at Cymer Inc. associated with power systems for… (More)
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2003
2003
Low jitter and drift high voltage IGBT gate driver
The Cymer Master Oscillator Power Amplifier (MOPA)-based light source requires tight timing control over all operating repetition… (More)
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2001
2001
Lifetime and reliability data of commercial excimer laser power systems modules
Since 1996, CYMER has manufactured over 1500 excimer lasers for the application of integrated circuit photolithography. Because… (More)
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2001
2001
Solid-state pulsed power module (SSPPM) design for a dense plasma focus (DPF) device for semiconductor lithography applications
A Dense Plasma Focus (DPF) is being developed at CYMER as a light source for Extreme Ultraviolet (EUV) Lithography applications… (More)
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