Cymer
National Institutes of Health
Papers overview
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Extreme ultraviolet (EUV) lithography produces 13.5 nm light by irradiating a droplet of molten Sn with a laser, creating a dense…
Environmental planning is complex, and requires careful consideration of a large number of factors, including quantitative ones…
Optofluidics integrates the fields of photonics and microfluidics, providing new freedom to both fields and permitting the…
We demonstrate a micro-resonator based on a channel waveguide terminated with metallic mirrors side coupled to a bus waveguide…
This paper is devoted to the development of laser produced plasma (LPP) EUV source architecture for advanced lithography…
Leading-edge scanners in fabs worldwide have particularly high system utilization and require peak levels of system throughput…
The EUV light source has been characterized as the top-priority critical issue facing the viability of EUV lithography. Cymer's…
This paper will summarize over 10 years of solid state pulsed power development at Cymer Inc. associated with power systems for…
Since the initial demonstration of EUV emission with Xenon as a source gas in Cymer's Dense Plasma Focus (DPF) device…
X-ray diffraction data processing proceeds through indexing, pre-refinement of camera parameters and crystal orientation…