Cymer

Summary: Here we present open‐source software for the analysis of high‐dimensional cytometry data using state of the art… Expand

Extreme ultraviolet (EUV) lithography produces 13.5 nm light by irradiating a droplet of molten Sn with a laser, creating a dense… Expand

The quest for an integrated light source that promises high energy efficiency and a fast modulation for high-performance photonic… Expand

We present experimental results on the observation of a bulk second-order nonlinear susceptibility, derived from both free-space… Expand

We demonstrate a micro-resonator based on a channel waveguide terminated with metallic mirrors side coupled to a bus waveguide… Expand

This paper is devoted to the development of laser produced plasma (LPP) EUV source architecture for advanced lithography… Expand

Leading-edge scanners in fabs worldwide have particularly high system utilization and require peak levels of system throughput… Expand

This paper applies process and circuit simulation to examine plausible explanations for measured differences in ring oscillator… Expand

The EUV light source has been characterized as the top-priority critical issue facing the viability of EUV lithography. Cymer's… Expand

This paper will summarize over 10 years of solid state pulsed power development at Cymer Inc. associated with power systems for… Expand