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Alt-Ergo

Alt-Ergo is an automatic solver for mathematical formulas, specifically designed for program verification. It is based on satisfiability modulo… 
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Related topics

Related topics

6 relations
Automated theorem provingB-MethodFrama-CRodin tool

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2016
2016
Improved efficiency in organic solar cells via conjugated polyelectrolyte additive in the hole transporting layer
An anionic conjugated polyelectrolyte poly[(9,9-bis(4-sulfonatobutyl sodium) fluorene-alt-phenylene)-ran-(4,7-di-2-thienyl-2,1,3… 
2016
2016
Hemodiyaliz Hastalarının Sıvı Kısıtlamasına Uyumlarının Değerlendirilmesi
Bu caliĢma; hemodiyaliz hastalarinin sivi kisitlamasina uyumlarini degerlendirmek ama-ciyla tanimlayici olarak yapildi. CaliĢma… 
2013
2013
HOMOGENIZATION OF COMPLEX FLOWS IN POROUS MEDIA AND APPLICATIONS
Our work is a contribution to the understanding of transport of solutes in a porous medium. It has applications in groundwater… 
2008
2008
Effects of polydispersity on the order-disorder transition of diblock copolymer melts
The effect of polydispersity on an AB diblock copolymer melt is investigated using lattice-based Monte Carlo simulations. We… 
Highly Cited
2006
Highly Cited
2006
Novel self-assembled metallo-homopolymers and metallo-alt-copolymer containing terpyridyl zinc(II) moieties
A series of novel terpyridyl Zn(II))-based metallo-polymers, including metallo-homopolymers and metallo-alt-copolymer, containing… 
2006
2006
Local CD variation in 65nm node with PSM processes STI topography characterization (I)
How to effectively control the critical dimension (CD) is always a hot topic in photolithography. In 65nm node using phase shift… 
2005
2005
Method of printing 100-nm random interconnect pattern with alt-PSM
The use of Alternating phase-shifting mask has been demonstrated to be a most powerful approach to expand resolution limitation… 
2004
2004
Effect of the effective resist diffusion length to the photolithography at 65- and 45-nm nodes: a study with simple and accurate analytical equations
As the current photolithography moves toward the 65 and 45 nm nodes, resist blur, which is now around 50 to 90 nm full width at… 
1998
1998
31. MANTLE MELTING SYSTEMATICS: TRANSITION FROM CONTINENTAL TO OCEANIC VOLCANISM ON THE SOUTHEAST GREENLAND MARGIN 1
We present trace element analyses of basaltic and picritic lavas recovered from the Ocean Drilling Program Leg 152 transect on… 
1989
1989
Role of activation of lipid peroxidation in the pathogenesis of experimental peritonitis
: Investigation was carried out for studying the role of lipid peroxidation (LP) in the genesis of destructive process in the… 
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