• DOI:10.1063/1.3407670
• Corpus ID: 121505991

Crystallization and high temperature shape memory behavior of sputter-deposited NiMnCoIn thin films

@article{Rios2010CrystallizationAH,
  title={Crystallization and high temperature shape memory behavior of sputter-deposited NiMnCoIn thin films},
  author={Steven Rios and Ibrahim Karaman and Xinghang Zhang},
  journal={Applied Physics Letters},
  year={2010},
  volume={96},
  pages={173102},
  url={https://api.semanticscholar.org/CorpusID:121505991}
}

• S. Rios, I. Karaman, Xinghang Zhang
• Published 26 April 2010
• Materials Science, Physics
• Applied Physics Letters

Amorphous Ni50Mn38Co6In6 films of 20 μm in thickness are fabricated using dc magnetron sputtering technique. Ex situ annealing studies demonstrate the crystallization at elevated temperature, and the retention of L10 martensite at room temperature. In situ annealing inside a transmission electron microscope reveals the crystallization process as well as the transformation to B2 austenite at elevated temperatures. Differential scanning calorimetry studies show the crystallization activation… 

Amorphous Ni50Mn38Co6In6 films of 20 μm in thickness are fabricated using dc magnetron sputtering technique. Ex situ annealing studies demonstrate the crystallization at elevated temperature, and the retention of L10 martensite at room temperature. In situ annealing inside a transmission electron microscope reveals the crystallization process as well as the transformation to B2 austenite at elevated temperatures. Differential scanning calorimetry studies show the crystallization activation energy of ∼239 kJ/mol, a reversible martensitic phase transformation temperature of ∼350 °C, and a hysteresis of ∼75 °C.