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coenzyme Q10 100 MG / Vitamin E 300 UNT Oral Wafer
Known as:
CoQ-10 100 MG / Vitamin E 300 UNT Oral Wafer
, alpha-tocopherol 300 UNT / ubidecarenone 100 MG Oral Wafer
, coenzyme Q10 100 MG / vitamin E acetate 300 UNT Oral Wafer
National Institutes of Health
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Oral Wafer
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2019
2019
Résection arthroscopique de la tête ulnaire (wafer arthroscopique) dans le conflit ulno-carpien
E. Abehsera
,
D. Fontès
2019
Corpus ID: 214016254
2016
2016
Higher and sub-harmonic Lamb wave mode generation due to debond-induced contact nonlinearity
Anurup Guha
,
C. R. Bijudas
SPIE Smart Structures and Materials…
2016
Corpus ID: 124441227
Non-cumulative higher and sub-harmonic Lamb wave mode generation as a result of partial-debond of piezoelectric wafer transducers…
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2009
2009
Productivity improvement in the wafer backside cleaning before exposure
S. Nishikido
,
T. Kitano
,
Y. Tokunaga
,
M. Strobl
,
Yu Chen Lin
Advanced Lithography
2009
Corpus ID: 119765064
In the photolithography process, with the miniaturization of pattern size, depth of focus (D.O.F) is also becoming smaller and…
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2008
2008
Pressure and velocity dependence of the material removal rate in the fast polishing process.
Wei Yang
,
Yinbiao Guo
,
Yaguo Li
,
Qiao Xu
Applied Optics
2008
Corpus ID: 6605008
Based on the direct contact between the wafer and the pad, the pressure and velocity dependence of the material removal rate (MRR…
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2008
2008
Plasma process equipment for etching wafer backside
김동완
,
이중희
,
허재민
2008
Corpus ID: 140025532
The present invention relates to a plasma processing apparatus for wafer backside etch to enlarge or reduce wafer backside…
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1998
1998
Water spots : The scourge of wafer drvers
L. Peters
1998
Corpus ID: 113449820
1997
1997
Zuverlässigkeitstest auf Wafer-Ebene
A. Dreizner
,
K. Lukat
1997
Corpus ID: 113441245
Stringent demands imposed on the reliability of printed circuits call for optimized production processes. New reliability tests…
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1993
1993
New resolution-enhancing mask for projection lithography based on in-situ off-axis illumination
R. Pforr
,
R. Jonckheere
,
+4 authors
L. Van den hove
Advanced Lithography
1993
Corpus ID: 129858198
A new technique has been developed for the illumination of a mask in a wafer stepper. A phase-shifting layer (a so-called…
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1993
1993
Drying apparatus of wafer rearface
J. Jang
,
Jonghwa Shin
1993
Corpus ID: 139938054
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