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Vapour phase decomposition

Known as: VPD, Vapor phase decomposition 
Vapour phase decomposition (VPD) is a method used in the semiconductor industry to improve the sensitivity of total-reflection X-ray fluorescence… 
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Related topics

Related topics

3 relations

Broader (1)

Semiconductor device fabrication
Semiconductor industryWafer (electronics)

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2018
2018
Responses of Hazelnut Trees to Organic and Conventional Managements in the Dryland
Hazelnut trees (Corylus avellana L.) give yields without any more reduction under dryland. However, it is not known how plant… 
2011
2011
Advanced Monitoring of Trace Metals Applied to Contamination Reduction of Silicon Device Processing
The detrimental effects of metallic on certain key electrical parameters of silicon devices mandates the use of state‐of‐the‐art… 
Review
2005
Review
2005
Characterization and control of microcontamination for advanced technology nodes and 300-mm wafer processing: overview and challenges
Advanced process technologies have been introducing many unseen problems on process yield and device reliability… 
2005
2005
Total reflection X-ray fluorescence spectrometry for the introduction of novel materials in clean-room production environments
In this paper, a number of case studies on the analysis of novel metallic contaminants on conventional and alternative substrates… 
2003
2003
Should We Analyze for Trace Metal Contamination at the Edge, Bevel, and Edge Exclusion of Wafers?
The edge, bevel, and edge exclusion area of a wafer has historically been difficult to monitor for trace metals. Standard trace… 
2002
2002
Study on Simple Transpiration Model and Fitted Measurement Time for Dominant Plant at Mudstone Area in Taiwan
The dominant process in water relation of the whole plant is the absorption of large quantities of water from the soil, its… 
1999
1999
Analysis of light elements on Si wafer by vapor-phase decomposition/total reflection X-ray fluorescence.
気相分解(VPD)を組み合わせた全反射蛍光X線分析(TXRF), VPD/TXRF法によって, Siウェハー上の極微量Na及びAlの分析を行った. Na及びAlの高感度分析を行うために, W-Mα線を用いてTXRF測定を行った.従来のTXRF… 
1999
1999
Copper contamination effect on the reliability of devices in the BiCMOS technology
Copper (Cu) will be used to replace aluminum in the next generation metallization due to its low resistivity and high… 
1999
1999
Applications of total reflection X-ray fluorescence to analysis of VLSI micro contamination
This paper demonstrates the microcontamination analysis on wafers after they went through the conventional ULSI processing steps… 
1996
1996
Applications of surface analytical techniques for metals reduction in ion implantation
Quadrupole and magnetic sector SIMS, total reflection X-ray fluorescence spectrometry (TXRF), vapor phase decomposition with both… 
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