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Plasma-enhanced chemical vapor deposition

Known as: PECVD, Plasma Enhanced Chemical Vapor Deposition, Plasma deposition process 
Plasma-enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate… Expand
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Papers overview

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Review
2017
Review
2017
AbstractIce particle formation in tropospheric clouds significantly changes cloud radiative and microphysical properties. Ice… Expand
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Highly Cited
2009
Highly Cited
2009
The Model for Ozone and Related chemical Tra- cers, version 4 (MOZART-4) is an offline global chemical transport model… Expand
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2006
2006
This paper presents the growth of vertically aligned carbon nanotubes by plasma-enhanced chemical vapor deposition (PECVD) using… Expand
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2005
2005
We have investigated phase separation, silicon nanocrystal (Si NC) formation and optical properties of Si oxide (SiOx, 0<x<2… Expand
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Highly Cited
2004
Highly Cited
2004
Uniformly distributed ZnO nanorods have been grown by plasma-enhanced chemical vapor deposition using a two-step process. By… Expand
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Highly Cited
2003
Highly Cited
2003
Silicon nanowires were selectively grown at temperatures below 400 °C by plasma enhanced chemical vapor deposition using silane… Expand
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Highly Cited
2003
Highly Cited
2003
Vertically aligned carbon nanotubes were grown at temperatures as low as 120 °C by plasma-enhanced chemical vapor deposition. A… Expand
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2000
2000
Aligned multiwall carbon nanotubes have been grown on silicon substrates by microwave plasma enhanced chemical vapor deposition… Expand
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Highly Cited
1999
Highly Cited
1999
Humans have altered global nitrogen cycling such that more atmospheric N2 is being converted (‘fixed’) into biologically reactive… Expand
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1992
1992
We have fabricated boron carbide thin films on Si(111) and other substrates by plasma‐enhanced chemical‐vapor deposition (PECVD… Expand
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