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Ion layer gas reaction
Ion layer gas reaction (ILGAR®) is a non-vacuum, thin-film deposition technique developed and patented by the group of Professor Dr. Christian…
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Related topics
Related topics
4 relations
Atomic layer deposition
Chemical bath deposition
Chemical vapor deposition
Broader (1)
Semiconductor device fabrication
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2017
2017
Preparation of Titania on Stainless Steel by the Spray-ILGAR Technique as Active Photocatalyst under UV Light Irradiation for the Decomposition of Acetaldehyde
S. Chandren
,
K. Ismail
,
Hadi Nur
,
B. Ohtani
2017
Corpus ID: 55253527
One of the methods used to produce buffer layers for thin film solar cells is the Spray ion layer gas reaction (SPRAY-ILGAR…
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2016
2016
Analysis of the Surface Passivation Mechanisms of p-Doped Crystalline Silicon by Two Different Al2O3 Coatings via Transient Photo-Conductance Measurements
D. Klein
,
W. Ohm
,
M. Krüger
,
M. Kunst
2016
Corpus ID: 56380512
In this paper, contactless transient photo-conductance measurements are applied to p-doped mono-crystalline Silicon (p-Si) coated…
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2005
2005
Study on CuInS_2 Thin Films Grown by Ion Layer Gas Reaction (ILGAR) Me thod
Qiuyue Ji
2005
Corpus ID: 101821237
CuInS2 thin films have been prepared by ion layer gas reaction (ILGAR) using C2H5OH as solvent, CuCl and InCl3 as reagents and…
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