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Ion beam lithography

Known as: IBL, Ion beam projection lithography, Ion projection lithography 
Ion beam lithography is the practice of scanning a focused beam of ions in a patterned fashion across a surface in order to create very small… 
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Papers overview

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Review
2014
Review
2014
Patterning with a focused ion beam (FIB) is an extremely versatile fabrication process that can be used to create microscale and… 
2011
2011
Optical lithography is the unrivalled mainstream patterning method that allows for costefficient, high-volume fabrication of… 
Highly Cited
2009
Highly Cited
2009
A scanning-helium-ion-beam microscope is now commercially available. This microscope can be used to perform lithography similar… 
Review
2005
Review
2005
To overcome the diffraction constraints of traditional optical lithography, the next generation lithographies (NGLs) will utilize… 
Review
2005
Highly Cited
2004
Highly Cited
2004
Well-aligned nanotip arrays were fabricated by electron cyclotron resonance (ECR) plasma process using gas mixtures of silane… 
Highly Cited
2003
Highly Cited
2003
Two new methods have been developed to precisely position gold nanoparticles on surfaces. The surface-active nanoparticles have a… 
Highly Cited
1999
Highly Cited
1999
Submicron patterning of 1 in. diameter curved surfaces with a 46 mm radius of curvature has been demonstrated with step and flash… 
Highly Cited
1983
Highly Cited
1983
  • A. Wagner
  • Advanced Lithography
  • 1983
  • Corpus ID: 121745790
A finely focused ion beam system is described. Beams of Ga, In, and Au ions emitted from a liquid metal ion source are routinely…