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Ion beam lithography

Known as: IBL, Ion beam projection lithography, Ion projection lithography 
Ion beam lithography is the practice of scanning a focused beam of ions in a patterned fashion across a surface in order to create very small… Expand
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Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
Review
2014
Review
2014
Patterning with a focused ion beam (FIB) is an extremely versatile fabrication process that can be used to create microscale and… Expand
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Highly Cited
2009
Highly Cited
2009
A scanning-helium-ion-beam microscope is now commercially available. This microscope can be used to perform lithography similar… Expand
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Review
2005
Review
2005
To overcome the diffraction constraints of traditional optical lithography, the next generation lithographies (NGLs) will utilize… Expand
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Review
2005
Review
2005
The nanometer-scale architectures in thin films of self-assembling block copolymers have inspired a variety of new applications… Expand
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Highly Cited
2004
Highly Cited
2004
Well-aligned nanotip arrays were fabricated by electron cyclotron resonance (ECR) plasma process using gas mixtures of silane… Expand
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Highly Cited
2003
Highly Cited
2003
A dip-pen nanolithography based strategy for fabricating and functionalizing Au nanostructures on a semiconductor substrate is… Expand
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Highly Cited
1999
Highly Cited
1999
Submicron patterning of 1 in. diameter curved surfaces with a 46 mm radius of curvature has been demonstrated with step and flash… Expand
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Highly Cited
1999
Highly Cited
1999
Abstract The combination of deep X-ray lithography with electroforming and micromoulding (i.e., LIGA) has been shown to offer… Expand
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1997
1997
LIGA and its defining process deep x-ray lithography, is an important method for machining high-aspect ratio microstructures, and… Expand
1987
1987
Apparatus and method for projection ion beam lithography are described which allow formation of low distortion, large field… Expand
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