Skip to search formSkip to main contentSkip to account menu

Hybrid physical-chemical vapor deposition

Known as: HPCVD 
Hybrid physical-chemical vapor deposition (HPCVD) is a thin-film deposition technique, that combines physical vapor deposition (PVD) with chemical… 
Wikipedia (opens in a new tab)

Related topics

Related topics

5 relations
Chemical vapor depositionDoping (semiconductor)Evaporation (deposition)Phase diagram

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2017
2017
Hybrid Physical Chemical Vapor Deposition of Magnesium Diboride Inside 3.9 GHz Mock Cavities
Magnesium diboride (MgB<sub>2</sub>) is considered a candidate for the next generation superconducting radio frequency (SRF… 
2011
2011
Properties of MgB 2 ultra-thin films grown by hybrid physical-chemical vapor deposition
We fabricate MgB 2 ultra-thin films via hybrid physical-chemical vapor deposition technique. Under the same background pressure… 
2008
2008
High quality MgB2 thick films and large-area films fabricated by hybrid physical–chemical vapor deposition with a pocket heater
A hybrid physical–chemical vapor deposition process using a pocket heater was developed for the growth of high quality epitaxial… 
2007
2007
Dual-Heater Reactor Design for Hybrid Physical-Chemical Vapor Deposition of ${\rm MgB}_{2}$ Thin Films
A new reactor configuration for the hybrid physical-chemical vapor deposition (HPCVD) of MgB2 thin films was developed. In this… 
2007
2007
Polycrystalline ${\rm MgB}_{2}$ Films on Flexible YSZ Substrates Grown by Hybrid Physical-Chemical Vapor Deposition
We report properties of polycrystalline MgB2 films deposited on thin flexible yttium-stabilized zirconia (YSZ) substrates by… 
2005
2005
Carbon-doped MgB/sub 2/ thin films grown by hybrid physical-chemical vapor deposition
Carbon-doped MgB/sub 2/ thin films have been produced with hybrid physical-chemical vapor deposition (HPCVD) by adding a carbon… 
2005
2005
The characterization of InN growth under high‐pressure CVD conditions
Gaining insight into the gas phase and surface chemistry processes that govern the growth of InN and indium‐rich group III… 
2005
2005
Nucleation and growth of InN by high-pressure chemical vapor deposition: Optical monitoring
The growth of high quality, stoichiometric InN presents a challenge because of the volatility of atomic nitrogen. To overcome the… 
2005
2005
Carbon-Doped Thin Films Grown by Hybrid Physical-Chemical Vapor Deposition
Carbon-doped thin films have been produced with hybrid physical-chemical vapor deposition (HPCVD) by adding a carbon-containing… 
1999
1999
Three-dimensional simulation of HPCVD-linking continuum transport and reaction kinetics with topography simulation
For wafer sizes in state of-the-art semiconductor manufacturing ranging up to 300 mm, the uniformity of processes across the… 
By clicking accept or continuing to use the site, you agree to the terms outlined in our Privacy Policy (opens in a new tab), Terms of Service (opens in a new tab), and Dataset License (opens in a new tab)