Hybrid physical-chemical vapor deposition

Known as: HPCVD 
Hybrid physical-chemical vapor deposition (HPCVD) is a thin-film deposition technique, that combines physical vapor deposition (PVD) with chemical… (More)
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Topic mentions per year

Topic mentions per year

1999-2017
024619992017

Papers overview

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2017
2017
Magnesium diboride (MgB<sub>2</sub>) is considered a candidate for the next generation superconducting radio frequency (SRF… (More)
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2014
2014
We fabricate MgB<sub>2</sub> ultrathin films via the hybrid physical-chemical vapor deposition (HPCVD) technique. With the proper… (More)
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2013
2013
A scaled-up hybrid physical-chemical vapor deposition (HPCVD) method has been developed to fabricate large-area high-quality… (More)
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2011
2011
We have studied the high-field properties of carbon-doped MgB2 thin films prepared by hybrid physical–chemical vapor deposition… (More)
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2007
2007
We report properties of polycrystalline MgB<sub>2</sub> films deposited on thin flexible yttium-stabilized zirconia (YSZ… (More)
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2007
2007
A new reactor configuration for the hybrid physical-chemical vapor deposition (HPCVD) of MgB<sub>2</sub> thin films was developed… (More)
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2005
2005
Carbon-doped MgB/sub 2/ thin films have been produced with hybrid physical-chemical vapor deposition (HPCVD) by adding a carbon… (More)
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1999
1999
We propose the use of proper orthogonal decomposition (POD) techniques as a reduced basis method for computation of feedback… (More)
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1999
1999
We present a summary of investigations on the use of proper orthogonal decomposition (POD) techniques as a reduced basis method… (More)
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