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Hybrid physical-chemical vapor deposition

Known as: HPCVD 
Hybrid physical-chemical vapor deposition (HPCVD) is a thin-film deposition technique, that combines physical vapor deposition (PVD) with chemical… 
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Papers overview

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2017
2017
Magnesium diboride (MgB<sub>2</sub>) is considered a candidate for the next generation superconducting radio frequency (SRF… 
2011
2011
We have studied the high-field properties of carbon-doped MgB2 thin films prepared by hybrid physical–chemical vapor deposition… 
2007
2007
A new reactor configuration for the hybrid physical-chemical vapor deposition (HPCVD) of MgB2 thin films was developed. In this… 
2007
2007
We report properties of polycrystalline MgB2 films deposited on thin flexible yttium-stabilized zirconia (YSZ) substrates by… 
2005
2005
Carbon-doped MgB/sub 2/ thin films have been produced with hybrid physical-chemical vapor deposition (HPCVD) by adding a carbon… 
2005
2005
A numerical model was developed to simulate vapor deposition in high-pressure chemical vapor-deposition reactors, under different… 
2005
2005
We have grown MgB/sub 2/ films at different substrate temperatures by hybrid physical-chemical vapor deposition. X-ray… 
2005
2005
Carbon-doped thin films have been produced with hybrid physical-chemical vapor deposition (HPCVD) by adding a carbon-containing… 
Highly Cited
2003
Highly Cited
2003
We have studied the effect of deposition rate and layer thickness on the properties of epitaxial MgB2 thin films grown by hybrid… 
2002
2002
This paper describes the development of a reduced order model-based feedback control methodology for regulation of the growth of…