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Hybrid physical-chemical vapor deposition

Known as: HPCVD 
Hybrid physical-chemical vapor deposition (HPCVD) is a thin-film deposition technique, that combines physical vapor deposition (PVD) with chemical… Expand
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Papers overview

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2017
2017
Magnesium diboride (MgB<sub>2</sub>) is considered a candidate for the next generation superconducting radio frequency (SRF… Expand
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2013
2013
Abstract The thermal stability of InN layers grown on sapphire by high-pressure chemical vapor deposition has been studied by… Expand
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2007
2007
A new reactor configuration for the hybrid physical-chemical vapor deposition (HPCVD) of MgB2 thin films was developed. In this… Expand
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2007
2007
We report properties of polycrystalline MgB2 films deposited on thin flexible yttium-stabilized zirconia (YSZ) substrates by… Expand
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2006
2006
Growth techniques that utilize elevated reactor pressures offer a pathway to overcome limitations in the epitaxy of high quality… Expand
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2005
2005
Carbon-doped MgB/sub 2/ thin films have been produced with hybrid physical-chemical vapor deposition (HPCVD) by adding a carbon… Expand
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2005
2005
The growth of high quality, stoichiometric InN presents a challenge because of the volatility of atomic nitrogen. To overcome the… Expand
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2005
2005
We have grown MgB/sub 2/ films at different substrate temperatures by hybrid physical-chemical vapor deposition. X-ray… Expand
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Highly Cited
2003
Highly Cited
2003
We have studied the effect of deposition rate and layer thickness on the properties of epitaxial MgB2 thin films grown by hybrid… Expand
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2002
2002
This paper describes the development of a reduced order model-based feedback control methodology for regulation of the growth of… Expand