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Hybrid physical-chemical vapor deposition

Known as: HPCVD 
Hybrid physical-chemical vapor deposition (HPCVD) is a thin-film deposition technique, that combines physical vapor deposition (PVD) with chemical… Expand
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Papers overview

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2017
2017
Magnesium diboride (MgB<sub>2</sub>) is considered a candidate for the next generation superconducting radio frequency (SRF… Expand
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2011
2011
We fabricate MgB 2 ultra-thin films via hybrid physical-chemical vapor deposition technique. Under the same background pressure… Expand
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2011
2011
A novel selective filling technique has been developed for the patterning of semiconductor materials in microstructured optical… Expand
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2008
2008
A hybrid physical–chemical vapor deposition process using a pocket heater was developed for the growth of high quality epitaxial… Expand
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2006
2006
Growth techniques that utilize elevated reactor pressures offer a pathway to overcome limitations in the epitaxy of high quality… Expand
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2005
2005
The growth of high quality, stoichiometric InN presents a challenge because of the volatility of atomic nitrogen. To overcome the… Expand
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2005
2005
Carbon-doped thin films have been produced with hybrid physical-chemical vapor deposition (HPCVD) by adding a carbon-containing… Expand
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2003
2003
We have carried out thermodynamics studies of the Mg-B system with the calculation of phase diagrams (CALPHAD) modeling technique… Expand
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2003
2003
We have studied the effect of deposition rate and layer thickness on the properties of epitaxial MgB2 thin films grown by hybrid… Expand
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2002
2002
This paper describes the development of a reduced order model-based feedback control methodology for regulation of the growth of… Expand
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