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Borophosphosilicate glass
Known as:
BPSG
, Borophophosilicate glass
Â
Borophosphosilicate glass, commonly known as BPSG, is a type of silicate glass that includes additives of both boron and phosphorus. Silicate glasses…Â
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Wikipedia
Topic mentions per year
Topic mentions per year
1985-2015
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2
4
1985
2015
Related topics
Related topics
5 relations
Phosphosilicate glass
Radiation hardening
Single event upset
Soft error
Broader (1)
Semiconductor device fabrication
Related mentions per year
Related mentions per year
1937-2018
1940
1960
1980
2000
2020
Borophosphosilicate glass
Semiconductor device fabrication
Soft error
Radiation hardening
Single event upset
Phosphosilicate glass
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2010
2010
B10 finding and correlation to thermal neutron soft error rate sensitivity for SRAMs in the sub-micron technology
Shi-Jie Wen
,
S. Y. Pai
,
Richard Wong
,
Michael Romain
,
Nelson N. Tam
2010 IEEE International Integrated Reliability…
2010
In this paper, we report the presence of B10 based on SIMS analysis in SRAM arrays in the 90nm to 45nm technology nodes. The…Â
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Highly Cited
2005
Highly Cited
2005
Soft errors in advanced computer systems
Robert Baumann
IEEE Design & Test of Computers
2005
As the dimensions and operating voltages of computer electronics shrink to satisfy consumers' insatiable demand for higher…Â
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2005
2005
Cancer-radiotherapy equipment as a cause of soft errors in electronic equipment
J. D. Wilkinson
,
Christopher O Bounds
,
T. Brown
,
B J Gerbi
,
Johann Peltier
IEEE Transactions on Device and Materials…
2005
The undesirable production of secondary neutrons by cancer-radiotherapy linear accelerators (linac) has been demonstrated to…Â
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2002
2002
Soft errors in SRAM devices induced by high energy neutrons, thermal neutrons and alpha particles
H. Kobayashi
,
K Shiraishi
,
+7 authors
T. Ishizaki
Digest. International Electron Devices Meeting,
2002
We measured the soft error rates (SER) of SRAM devices in several field tests, and obtained SERs induced independently by high…Â
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1997
1997
A Fully Printable, Self-aligned And Planarized Stacked Capacitor DRAM Cell Technology For 1Gbit DRAM And Beyond
Kohyama
,
Ozaki
,
+7 authors
Hayasaka
1997 Symposium on VLSI Technology
1997
Introduction In order to achieve <400mm2 chip size for lGDRAM production, 0.3um pitch fine patterning must be needed…Â
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1997
1997
A selective-epitaxial SiGe HBT with SMI electrodes featuring 9.3-ps ECL-gate delay
Kana Washio
,
Eiji Ohue
,
M. Tanabe
,
Hiroshi Shimamoto
,
Teruaki Onai
International Electron Devices Meeting. IEDM…
1997
A selective-epitaxial SiGe base heterojunction bipolar transistor (HBT) with self-aligned stacked metal/IDP (SMI) electrodes is…Â
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1996
1996
Sub-10-fJ ECL/68-/spl mu/A 4.7-GHz divider ultra-low-power SiGe base bipolar transistors with a wedge-shaped CVD-SiO/sub 2/ isolation structure and a BPSG-refilled trench
M. Kondo
,
K. Oda
,
+4 authors
Kana Washio
International Electron Devices Meeting. Technical…
1996
Ultra-low-power SiGe base bipolar transistors with a wedge-shaped CVD-SiO/sub 2/ isolation structure and a boro-phosphosilicate…Â
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1989
1989
Reduction of Titanium Silicide Degradation During Borophosphosilicate Glass Reflow
Russ R. Burmester
,
Holger Joswig
,
A. Mitwalsky
ESSDERC '89: 19th European Solid State Device…
1989
The application of a self-aligned silicide (``salicide'') process with Ti requires reduction of following excessive heat…Â
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1987
1987
Moisture Resistance of Borophosphosilicate Glass Films
Michiko Yoshimaru
,
H. Matsuhasi
,
T. Ajioka
,
Hiroshi Matsui
25th International Reliability Physics Symposium
1987
The moisture resistance of chemically vapor deposited borophosphosilicate glass (BPSG) films has been studied. The films were…Â
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1985
1985
A novel borophosphosilicate glass process
C. Y. Fu
1985 International Electron Devices Meeting
1985
A novel low cost borophosphosilicate glass (BPSG) technology suitable for one micron processing is presented here. This technique…Â
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