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Borophosphosilicate glass
Known as:
BPSG
, Borophophosilicate glass
Borophosphosilicate glass, commonly known as BPSG, is a type of silicate glass that includes additives of both boron and phosphorus. Silicate glasses…
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Related topics
Related topics
5 relations
Phosphosilicate glass
Radiation hardening
Single event upset
Soft error
Broader (1)
Semiconductor device fabrication
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2006
2006
Investigation of Thermal Neutron Induced Soft Error Rates in Commercial Srams with 0.35 μm to 90 nm Technologies
Marcos Olmos
,
Rémi Gaillard
,
A. V. Overberghe
,
Jérôme Beaucour
,
S. Wen
,
S. Chung
IEEE International Reliability Physics Symposium…
2006
Corpus ID: 40162594
Measurement of soft error rates (SER) often commercial SRAMs of 0.35 μm to 90 nm technologies have been completed at the Institut…
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2005
2005
Ultrathin strained-SOI by stress balance on compliant substrates and FET performance
Haizhou Yin
,
K. Hobart
,
R. L. Peterson
,
F. Kub
,
J. Sturm
IEEE Transactions on Electron Devices
2005
Corpus ID: 304802
Ultrathin, strained-silicon-on-insulator (s-SOI) structures without a residual silicon-germanium (SiGe) underlayer have been…
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2003
2003
Strain partition of Si/SiGe and SiO2/SiGe on compliant substrates
H. Yin
,
K. Hobart
,
F. Kub
,
S. Shieh
,
T. Duffy
,
J. Sturm
2003
Corpus ID: 123539121
Strain partitioning of crystalline Si and amorphous SiO2 deposited on crystalline SiGe on a compliant viscous…
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Highly Cited
2002
Highly Cited
2002
Strain relaxation of SiGe islands on compliant oxide
H. Yin
,
Rui Huang
,
+7 authors
J. Sturm
2002
Corpus ID: 15370336
The relaxation of patterned, compressively strained, epitaxial Si0.7Ge0.3 films transferred to borophosphorosilicate (BPSG) glass…
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2001
2001
Developments of new concept analytical instruments for failure analyses of sub-100 nm devices
Y. Mitsui
,
F. Yano
,
H. Kakibayashi
,
H. Shichi
,
T. Aoyama
Microelectronics and reliability
2001
Corpus ID: 29042182
1995
1995
3-D numerical modeling of thermal flow for insulating thin film using surface diffusion
M. Fujinaga
,
I. Tottori
,
T. Kunikiyo
,
T. Uchida
,
N. Kotani
,
Y. Tsukamoto
IEEE Trans. Comput. Aided Des. Integr. Circuits…
1995
Corpus ID: 37467651
This paper presents a three-dimensional (3-D) numerical surface diffusion model of BPSG glass flow of surface tension. The…
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1987
1987
Moisture Resistance of Borophosphosilicate Glass Films
M. Yoshimaru
,
H. Matsuhasi
,
T. Ajioka
,
H. Matsui
IEEE International Reliability Physics Symposium
1987
Corpus ID: 46164899
The moisture resistance of chemically vapor deposited borophosphosilicate glass (BPSG) films has been studied. The films were…
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1987
1987
Glass Reflow Modeling for Process Optimization
A. Tissier
,
A. Poncet
,
J. Teissier
European Solid-State Device Research Conference
1987
Corpus ID: 28148714
PSG and BPSG are intensively used in VLSI processes for their flow capability In a micronic multilevel metallisation technology…
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1985
1985
Optimized chemical vapor deposition of borophosphosilicate glass films
W. Kern
,
W. Kurylo
,
C. Tino
1985
Corpus ID: 94024296
Le depot sous pression atmospherique est effectue dans des conditions optimales pour economiser les reactifs et reduire la…
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1985
1985
Quantitative determination of boron and phosphorus in borophosphosilicate glass by secondary ion mass spectrometry
P. Chu
,
S. Grube
1985
Corpus ID: 53599834
Profils de concentration de films de borophosphosilicate. La distribution de P et B est obtenue avec une precision de ±15%
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