n-Type TiO2 Thin Films for Electrochemical Ozone Production

@inproceedings{Kitsuka2010nTypeTT,
  title={n-Type TiO2 Thin Films for Electrochemical Ozone Production},
  author={Kenta Kitsuka and Kazuhiro Kaneda and Mineo Ikematsu and Masahiro Iseki and Katsuhiko Mushiake and Takeo Ohsaka},
  year={2010}
}
An electrode for the electrochemical production of ozone, which has the compositional sequence Si/TiO x /Pt/TiO 2 (TiO x is titanium oxide), was fabricated by sputtering TiO 2 thin film (the thickness is typically 300 nm) on a Si/TiO x /Pt substrate. The TiO 2 thin film was characterized by X-ray diffraction, transmission electron microscopy, UV photoelectron spectroscopy, UV-visible spectroscopy, and photoelectrochemical measurements: It is an n-type semiconductor of the rutile-type TiO 2… CONTINUE READING