bi-epitaxial dc SQUIDs st ~ uctutled by focused ion beam etching from single junctions : 13 L optimisation

Focused ion beam etching has been used to pattern dc SQUIDs into previously characterised template biepitaxial grain boundary junctions. In this way, the screening parameter ~t~ can be optimised for a chosen temperature (in our case 30 K). Electrical characteristics, including noise measurements, are presented. A minimal white noise level of 22 ~tqbo.HZ m… CONTINUE READING