XPS analysis of the lithium intercalation in amorphous tungsten oxysulfide thin films

@inproceedings{Martn1999XPSAO,
  title={XPS analysis of the lithium intercalation in amorphous tungsten oxysulfide thin films},
  author={Ignacio Mart{\'i}n and Philippe Vinatier and Alain R. Levasseur and J. C. Dupin and Danielle Gonbeau},
  year={1999}
}
Abstract Amorphous thin films of tungsten oxysulfide have been prepared by radio frequency (RF) magnetron sputtering. The composition of thin films is varied by changing the pressure of the reactive gas (O 2 ) and discharge gas (Ar+O 2 ) in the sputtering chamber. The X-ray photoelectron spectroscopy (XPS) studies of the thin films have shown three different types of environment for tungsten atoms: W 6+ surrounded by oxygen O 2− , W 4+ surrounded by sulphur S 2− and W 5+ in a mixed oxygen… CONTINUE READING