Work function control of metal gates by interdiffused Ni-Ta with high thermal stability


By using the Ni-Ta alloys fabricated by interdiffusing stacks of Ni and Ta, we have experimentally investigated the work function (/spl phi//sub m/) controllability and thermal stability required for the advanced metal gate MOSFETs. The capacitance-voltage (C-V) measurement of the interdiffused Ni/Ta and Ta/Ni stacks revealed that the /spl phi//sub m/ of… (More)


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