Why to Use Dual-Vt, If Single-Vt Serves the Purpose Better under Process Parameter Variations?

  • Sudip Roy, Ajit Pal
  • Published 2008 in
    2008 11th EUROMICRO Conference on Digital System…

Abstract

As the fabrication process technology is moving from submicron region to deep submicron or nanometer region, the impact of process parameter variations are becoming more and more dominant, increasing the loss in yield due to variations in leakage power and delay. As a consequence, parametric yield loss has become a serious concern of the fabrication houses… (More)
DOI: 10.1109/DSD.2008.37

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Cite this paper

@article{Roy2008WhyTU, title={Why to Use Dual-Vt, If Single-Vt Serves the Purpose Better under Process Parameter Variations?}, author={Sudip Roy and Ajit Pal}, journal={2008 11th EUROMICRO Conference on Digital System Design Architectures, Methods and Tools}, year={2008}, pages={282-289} }