• Corpus ID: 239885496

Wet Scandium Etching for hard mask formation on a silicon substrate

@inproceedings{Bondareva2021WetSE,
  title={Wet Scandium Etching for hard mask formation on a silicon substrate},
  author={Julia V Bondareva and E R Timofeeva and Alexander Anikanov and Maxim Krasilnikov and M V Shibalov and Vasily Sen and A M Mumlyakov and Stanislav A. Evlashin and Mikhail Tarkhov},
  year={2021}
}
Nowadays, microelectronics and nanoelectronics require the search for new materials, including masks for creating structures. Today, the intermediate hard mask strategy is one of the key issues in achieving a good balance between lithography and etching at the microelectronic fabrication. One of the interesting challenges in microelectronics and photovoltaics is the creation of interspacing, vertically oriented silicon arrays on Si substrate for semiconductor devices with multi-function. The… 

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