Volatile Heteroligand Complexes of Copper(II): New Precursors for Chemical Vapor Deposition of Copper Films

@article{Krisyuk2018VolatileHC,
  title={Volatile Heteroligand Complexes of Copper(II): New Precursors for Chemical Vapor Deposition of Copper Films},
  author={B. V. Krisyuk and Asiya E. Turgambaeva and Pavel A. Stabnikov and Igor K. Igumenov and Sergey V. Sysoev and Yu. M. Rumyantsev and Svetlana A. Prokhorova and E. A. Maksimovskii and Olga Maslova},
  journal={Russian Journal of Applied Chemistry},
  year={2018},
  volume={91},
  pages={1068-1075}
}
Two heteroligand ketoiminate–diketonate complexes of copper(II), CuL(hfa) (1), L = pentane-2-imino-4-onato, CH3COCHCNHCH3–, and CuL′(hfa) (2), L′ = 2,2,6,6-tetramethyl-3-iminoheptane-5-onato, C(CH3)3COCHCNHC(CH)–, were studied as precursors for chemical vapor deposition of copper films. The flow method was employed to measure the temperature dependences of a saturated vapor pressure of these compounds, the thermodynamic parameters of evaporation–sublimation were calculated, and the volatilities… CONTINUE READING

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Application of Thermodynamics to Biological and Materials

I. K. Igumenov, T. V. Basova, V. R. Belosludov
  • 2011
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