Virtual metrology: a solution for wafer to wafer advanced process control

@article{Chen2005VirtualMA,
  title={Virtual metrology: a solution for wafer to wafer advanced process control},
  author={P. T. Chen and S. Y. Wu and Junshien Lin and F. Ko and H. Y. Lo and J. Wang and C. H. Yu and M. Liang},
  journal={ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005.},
  year={2005},
  pages={155-157}
}
Virtual metrology (VM) is a novel technology to predict wafer performance from tool slate variables. Virtual metrology can enable wafer to wafer control without additional real metrology. 
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