Very low energy implanted Bragg gratings in SOI for wafer scale testing applications

@article{Loiacono2011VeryLE,
  title={Very low energy implanted Bragg gratings in SOI for wafer scale testing applications},
  author={Renzo Loiacono and Rob Topley and Agnes Nakyobe and Goran Z. Mashanovich and Russel Gwilliam and Giorgio Lulli and Ran Feldesh and R. D. Jones and Graham T. Reed},
  journal={8th IEEE International Conference on Group IV Photonics},
  year={2011},
  pages={51-53}
}
We present Bragg gratings with an effective index change introduced by implanting germanium at only 15KeV. An extinction ratio of 35dB at 1350nm is demonstrated for device lengths of 600µm, furthermore laser annealing is demonstrated. 

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