Uptake of Copper Acetamidinate ALD Precursors on Nickel Surfaces

@inproceedings{Ma2009UptakeOC,
  title={Uptake of Copper Acetamidinate ALD Precursors on Nickel Surfaces},
  author={Qiang Ma and Hansheng Guo and Roy G. Gordon and Francisco Zaera},
  year={2009}
}
The adsorption and thermal activation of copper(I)-N,N0-di-sec-butylacetamidinate on a Ni(110) single-crystal surface were characterized in connection with the use of that compound as a precursor for the growth of copper films via atomic layer deposition (ALD) processes. Studies were carried out under ultrahigh vacuum (UHV) conditions by using a combination of X-ray photoelectron spectroscopy (XPS), low-energy ion scattering (LEIS), and temperature-programmed desorption (TPD). A temperature… CONTINUE READING
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