Unveiling the shape-diversified silicon nanowires made by HF/HNO3 isotropic etching with the assistance of silver.
@article{Chen2015UnveilingTS, title={Unveiling the shape-diversified silicon nanowires made by HF/HNO3 isotropic etching with the assistance of silver.}, author={Chia-Yun Chen and Ching-Ping Wong}, journal={Nanoscale}, year={2015}, volume={7 3}, pages={ 1216-23 } }
Hydrofluoric (HF)/nitric (HNO3)/acetic (CH3COOH) acid, normally referred to as the HNA method, is a widely utilized technique for performing isotropic etching on silicon (Si) in industrial Si-based processing and device construction. Here, we reported a novel etching strategy based on a HF/HNO3 process with the assistance of silver (Ag) nano-seeds, offering good controllability in preparing diversified Si nanostructure arrays with particularly smooth top surfaces. The involved mechanism was… CONTINUE READING
Citations
Publications citing this paper.
SHOWING 1-5 OF 5 CITATIONS
Superhydrophobic Hierarchical Silicon Structures: Fabrication and Property Characterization
VIEW 7 EXCERPTS
CITES BACKGROUND
Stable Superwetting Surface Prepared with Tilted Silicon Nanowires
VIEW 1 EXCERPT
CITES METHODS