Uniform Wafer-Scale Chemical Vapor Deposition of Graphene on Evaporated Cu (111) Film with Quality Comparable to Exfoliated Monolayer

@article{Tao2012UniformWC,
  title={Uniform Wafer-Scale Chemical Vapor Deposition of Graphene on Evaporated Cu (111) Film with Quality Comparable to Exfoliated Monolayer},
  author={L. Tao and Jongho Lee and Milo Holt and Harry Chou and S. McDonnell and Domingo A. Ferrer and Matias G. Babenco and Robert M. Wallace and Sanjay K. Banerjee and Rodney S. Ruoff and Deji Akinwande},
  journal={Journal of Physical Chemistry C},
  year={2012},
  volume={116},
  pages={24068-24074}
}
This article demonstrated monolayer graphene grown on annealed Cu (111) films on standard oxidized 100-mm Si wafers with higher quality than existing reports. Large area Raman mapping indicated high uniformity (>97% coverage) of monolayer graphene with immeasurable defects (>95% defect-negligible) across the entire wafer. Key to these results is the phase transition of evaporated copper films from amorphous to (111) preferred crystalline, which resulted in subsequent growth of high quality… Expand

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