Ultrathin oxide films by atomic layer deposition on graphene.

@article{Wang2012UltrathinOF,
  title={Ultrathin oxide films by atomic layer deposition on graphene.},
  author={Luda Wang and Jonathan J. Travis and Andrew S. Cavanagh and Xinghui Liu and Steven P. Koenig and Pinshane Y Huang and Steven M George and Joseph Scott Bunch},
  journal={Nano letters},
  year={2012},
  volume={12 7},
  pages={
          3706-10
        }
}
In this paper, a method is presented to create and characterize mechanically robust, free-standing, ultrathin, oxide films with controlled, nanometer-scale thickness using atomic layer deposition (ALD) on graphene. Aluminum oxide films were deposited onto suspended graphene membranes using ALD. Subsequent etching of the graphene left pure aluminum oxide films only a few atoms in thickness. A pressurized blister test was used to determine that these ultrathin films have a Young's modulus of 154… CONTINUE READING
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