Ultrafast and direct imprint of nanostructures in silicon

@article{Chou2002UltrafastAD,
  title={Ultrafast and direct imprint of nanostructures in silicon},
  author={Stephen Y. Chou and Chris Keimel and Jian Gu},
  journal={Nature},
  year={2002},
  volume={417},
  pages={835-837}
}
The fabrication of micrometre- and nanometre-scale devices in silicon typically involves lithography and etching. These processes are costly and tend to be either limited in their resolution or slow in their throughput. Recent work has demonstrated the possibility of patterning substrates on the nanometre scale by ‘imprinting’ or directed self-assembly, although an etching step is still required to generate the final structures. We have devised and here demonstrate a rapid technique for… Expand
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References

SHOWING 1-10 OF 15 REFERENCES
Imprint Lithography with 25-Nanometer Resolution
A high-throughput lithographic method with 25-nanometer resolution and smooth vertical sidewalls is proposed and demonstrated. The technique uses compression molding to create a thickness contrastExpand
Emerging Methods for Micro- and Nanofabrication
New methods for micro- and nanofabrication will be essential to scientific progress in many areas of biology, physics, chemistry, and materials science. They will also form enabling technologies forExpand
Pushing the limits of lithography
TLDR
Although the introduction of shorter-wavelength light sources and resolution-enhancement techniques should help maintain the current rate of device miniaturization for several more years, a point will be reached where optical lithography can no longer attain the required feature sizes. Expand
Lithographically induced self-assembly of periodic polymer micropillar arrays
We observed, and believe it to be the first time, the self-formation of periodic, supramolecular (micrometer scale) pillar arrays in a thin, single-homopolymer film melt, which was originally flat onExpand
In-situ doping of silicon using the gas immersion laser doping (GILD) process
Abstract In this work we use built in diagnostic capabilities to demonstrate gas immersion laser doping (GILD) as an in-situ doping technique. A HeNe laser reflectivity apparatus measures the siliconExpand
Thin-base bipolar transistor fabrication using gas immersion laser doping
Gas immersion laser doping (GILD) is used to fabricate the base and emitter regions of narrow-base n-p-n bipolar transistors. The GILD process is unique in that it allows simple fabrication ofExpand
Liquid phase reflectivity under conditions of laser-induced silicon melting
Dynamics of liquid silicon reflectivity at the wavelength of 0.63 µm is investigated under conditions of single-pulse heating of the semiconductor surface with ultraviolet radiation of an ArF excimerExpand
Measurement of the density and the thermal expansion coefficient of molten silicon using electromagnetic levitation
Abstract The density and the thermal expansion coefficient of molten silicon with various dopants (Sb, B and Ga) were measured in the wide temperature range from 1100 to 1730°C including undercooledExpand
Ab initio Molecular Dynamics Simulation of Laser Melting of Silicon.
TLDR
It is found that a high concentration of excited electrons dramatically weakens the covalent bond and the system undergoes a melting transition to a metallic state. Expand
Liquid phase reflectivity under conditions of laser induced melting
  • Semiconductors
  • 2000
...
1
2
...