UV-LIGA: From Development to Commercialization

@article{Genolet2014UVLIGAFD,
  title={UV-LIGA: From Development to Commercialization},
  author={G. Genolet and Hubert Lorenz},
  journal={Micromachines},
  year={2014},
  volume={5},
  pages={486-495}
}
  • G. Genolet, Hubert Lorenz
  • Published 2014
  • Materials Science, Computer Science
  • Micromachines
  • A major breakthrough in UV-LIGA (Lithographie, Galvanoformung and Abformung) started with the use of epoxy-based EPON® SU-8 photoresist in the mid-1990s. Using this photoresist has enabled the fabrication of tall and high aspect ratio structures without the use of a very expensive synchrotron source needed to expose the photoresist layer in X-ray LIGA. SU-8 photoresist appeared to be well-suited for LIGA templates, but also as a permanent material. Based on UV-LIGA and SU-8, Mimotec SA has… CONTINUE READING

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    References

    Publications referenced by this paper.
    SHOWING 1-10 OF 22 REFERENCES
    High-aspect-ratio resist for thick-film applications
    • 129
    LIGA and its applications
    • 47