Two-dimensional process simulation using verified phenomenological models


Two-dimensional (2-D) effects are becoming increasingly important in the diffusion of impurities in submicrometer silicon devices. Existing process simulators cannot accurately model some of these effects. We describe a 2-D process simulator PREDICT2 that handles implant damage effects, annealing, and lateral diffusion. PREDICT2 simulates the diffusion of… (More)
DOI: 10.1109/43.79501


10 Figures and Tables

Slides referencing similar topics