Tuning interfacial spin filters from metallic to resistive within a single organic semiconductor family

Abstract

Jingying Wang,1 Andrew Deloach,1 Wei Jiang,2 Christopher M. Papa,3 Mykhaylo Myahkostupov,3 Felix N. Castellano,3 Feng Liu,2 and Daniel B. Dougherty1,* 1Department of Physics, North Carolina State University, Raleigh, North Carolina 27695-8202, USA 2Department of Material Science and Engineering, University of Utah, Salt Lake City, Utah 84112, USA 3Department of Chemistry, North Carolina State University, Raleigh, North Carolina 27695-8204, USA (Received 6 January 2017; revised manuscript received 26 May 2017; published 30 June 2017)

Cite this paper

@inproceedings{Wang2017TuningIS, title={Tuning interfacial spin filters from metallic to resistive within a single organic semiconductor family}, author={Jingying Wang and Andrew Deloach and Wei Jiang and Christopher M. Papa and Mykhaylo Myahkostupov and Felix N Castellano and Feng Liu and Daniel B Dougherty}, year={2017} }