Transfer of Direct and Moiré Patterns by Reactive Ion Etching Through Ex Situ Fabricated Nanoporous Polymer Masks.

@article{Shvets2015TransferOD,
  title={Transfer of Direct and Moir{\'e} Patterns by Reactive Ion Etching Through Ex Situ Fabricated Nanoporous Polymer Masks.},
  author={Violetta Shvets and Thomas Hentschel and Lars Schulte and Lisa K Tschammer and A. Cagliani and Peter B\oggild and Kristoffer Almdal and Sokol Ndoni},
  journal={Langmuir : the ACS journal of surfaces and colloids},
  year={2015},
  volume={31 22},
  pages={6245-52}
}
We present a conceptually simple approach to nanolithographic patterning utilizing ex situ fabricated nanoporous masks from block copolymers. The fabricated block copolymer (BC) masks show predictable morphology based on the correlation between BC composition and bulk properties, independent of substrates' surface properties. The masks are prepared by… CONTINUE READING