Timing analysis and optimization implications of bimodal CD distribution in double patterning lithography

@article{Jeong2009TimingAA,
  title={Timing analysis and optimization implications of bimodal CD distribution in double patterning lithography},
  author={Kwangok Jeong and Andrew B. Kahng},
  journal={2009 Asia and South Pacific Design Automation Conference},
  year={2009},
  pages={486-491}
}
Double patterning lithography (DPL) is in current production for memory products, and is widely viewed as inevitable for logic products at the 32nm node. DPL decomposes and prints the shapes of a critical-layer layout in two exposures. In traditional single-exposure lithography, adjacent identical layout features will have identical mean critical dimension… CONTINUE READING