Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system)

@article{Hirai1991ThreedimensionalRP,
  title={Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system)},
  author={Yoshihiko Hirai and Sadafumi Tomida and Kazushi Ikeda and Masaru Sasago and Masayuki Endo and Sigeru Hayama and Noboru Nomura},
  journal={IEEE Trans. on CAD of Integrated Circuits and Systems},
  year={1991},
  volume={10},
  pages={802-807}
}
A three-dimensional topographical simulator PEACE (Photo and Electron beam lithography Analyzing Computer Engineering system) is developed. One of the difficulties in resist topographical simulation exists due to the threedimensional resist development algorithm. A newly developed algorithm based on the cell removal model provides accurate and stable… CONTINUE READING